Nobuya Miyoshi

Hitachi (Japan) — Japan

Engineering · Physical Sciences

13h-index437citations53works0.52yr avg
OpenAlex↗ORCID↗Google Scholar↗Lab page↗

Accepting Students?

No reports yet. Know if this professor is taking students?

Research Topics

Semiconductor materials and devices(17), Plasma Diagnostics and Applications(15), Atomic and Molecular Physics(10), Laser-Plasma Interactions and Diagnostics(9), Metal and Thin Film Mechanics(8)

Publications53 total

<i>(Invited)</i> Highly Selective and Isotropic Atomic Layer Etching Using Dry Chemical Removal
ECS Meeting Abstracts·2025
Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2024· 1 cited
Selective isotropic atomic-layer etching of thin films by using dry chemical removal tool
2023· 1 cited
Isotropic atomic layer etchings of various materials by using dry chemical removal
Japanese Journal of Applied Physics·2022· 15 citedOpen Access
Atomic layer etching of titanium nitride with surface modification by Cl radicals and rapid thermal annealing
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2022· 6 cited
Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2022· 7 cited
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2021· 20 cited
Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2021· 17 cited
Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF <sub>3</sub> /O <sub>2</sub> downstream plasma
Journal of Physics D Applied Physics·2019· 22 cited
Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2019· 31 cited
【Highlighted Presentation】Demonstration of Self-limiting Characteristics and Selectivity Control in Annealing Steps for Rapid Thermal-Cyclic ALE
The Japan Society of Applied Physics·2018
Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride
2018· 4 cited
[INVITED] Plasma etching technology of ULSI devices in IoT
The Japan Society of Applied Physics·2018
Rapid Thermal Cyclic Atomic-Level Etching of Tungsten
The Japan Society of Applied Physics·2018
(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication
ECS Meeting Abstracts·2017
(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication
ECS Transactions·2017· 6 cited
Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate
Japanese Journal of Applied Physics·2017· 56 citedOpen Access
Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing
Journal of Physics D Applied Physics·2017· 25 cited
Incident energy dependence of the scattering dynamics of water molecules on silicon and graphite surfaces: the effect on tangential momentum accommodation
Microfluidics and Nanofluidics·2017· 11 cited
Hyperthermal molecular beam source using a non-diaphragm-type small shock tube
Review of Scientific Instruments·2016· 1 cited
page 1 of 3Next →

Frequent Co-authors

Ikuya Kinefuchi(22), Shu Takagi(21), Yoichiro Matsumoto(17), Hiroyuki Kobayashi(15), Kazunori Shinoda(15), Masaru Izawa(14), Kenji Ishikawa(11), Masaru Hori(10), Yuta Yoshimoto(10), Kenichi Osuka(9), Masaru Kurihara(7), Kazuya Shimizu(5), Yusuke Mori(4), Yasuo Kitaoka(4), Mamoru Imade(4), Masashi Yoshimura(4), T. Sasaki(4), Shuhei Nagata(4), Yutaka Kouzuma(3), Kohei Kawamura(3)