James B. Claypool

Missouri University of Science and Technology — United States

Engineering · Physical Sciences

6h-index105citations19works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(10), Optical Coatings and Gratings(10), Copper Interconnects and Reliability(5), Nanofabrication and Lithography Techniques(5), Semiconductor materials and devices(4)

Publications19 total

Characterization of cobalt containing and cobalt-free trivalent chromium passivations on γ-ZnNi coated steel substrates
Thin Solid Films·2021· 9 cited
Characterization of Cobalt-Containing and Cobalt-free Trivalent Chromium Passivation Layers on γ-ZnNi-Coated Al6061-T6 Substrates
ACS Applied Materials & Interfaces·2021· 11 cited
Thin-Film Capacitor Technology for Improving Broadband Power Integrity
IEEE Transactions on Components Packaging and Manufacturing Technology·2019· 2 cited
Effect of Thickness on the Structure and Corrosion Performance of Sputtered Ce-Al-O Coatings on Al 2024-T3 Alloy Substrates
Journal of The Electrochemical Society·2018
Corrosion Behavior and Contact Resistance of Electroplated γ-ZnNi with Passivation Layers
ECS Meeting Abstracts·2016
Structure and Corrosion Behavior of Sputter Deposited Ce-Al-O Coating on Al 2024-T3 Alloy Substrates
Journal of The Electrochemical Society·2016· 11 cited
Structure and corrosion behavior of sputter deposited cerium oxide based coatings with various thickness on Al 2024-T3 alloy substrates
Applied Surface Science·2015· 38 cited
Materials for and performance of multilayer lithography schemes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 6 cited
New advanced BARC materials for ultra-high NA applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 6 cited
New materials for 193-nm bottom antireflective coatings
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003
Design considerations for bottom antireflective coating for 157 nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 1 cited
Thin organic bottom antireflective coatings for 193 nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 4 cited
Design considerations for bottom antireflective coating for 157 nm lithography
2002
New fast-etching bottom antireflective coatings for 248-nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001
Development of full-fill bottom antireflective coatings for dual-damascene process
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001· 9 cited
Second-generation 193-nm bottom antireflective coatings (BARCs)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000· 1 cited
Broadband planarizing antireflective coating for i-line, DUV, and 193-nm microlithographic applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999
Recent progress in 193-nm antireflective coatings
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 3 cited
Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1998· 4 cited

Frequent Co-authors

Matthew J. O’Keefe(7), Gu Xu(4), James E. Lamb(4), Xie Shao(4), Vandana Krishnamurthy(4), James D. Meador(4), Yuanyuan Liu(3), Jiamu Huang(3), William G. Fahrenholtz(3), Kenichi Mizusawa(3), Marc Weimer(3), Jill Akers(3), Rama Puligadda(3), Kevin Foster(2), Tarek Nahlawi(2), Felix Almodovar(2), Yubao Wang(2), Yasuhisa Sone(2), Douglas J. Guerrero(2), Mandar Bhave(2)