K. Neumeier

Fraunhofer Research Institution for Microsystems and Solid State Technologies — Germany

Engineering · Physical Sciences

3h-index33citations22works0.02yr avg
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Research Topics

Semiconductor materials and devices(8), Advancements in Semiconductor Devices and Circuit Design(5), Water Quality Monitoring and Analysis(4), Silicon and Solar Cell Technologies(3), Integrated Circuits and Semiconductor Failure Analysis(3)

Publications22 total

Charge and Capacitance Sensitive Field Effect Transistor (CCSFET) for Chemical Sensing
IEEE Sensors Journal·2025Open Access
Charge and Capacitance Sensitive Field Effect Device for Measurements in Gases and Liquids
2025
Charge and Capacitance Sensitive Field Effect Transistor (CCSFET) for Chemical Sensing
2025Open Access
3D-Integrated Superconducting qubits: CMOS-Compatible, Wafer-Scale Processing for Flip-Chip Architectures
arXiv (Cornell University)·2025Open Access
Comparison of annealing quality after 3e15/cm2 50 keV BF2+ implant between rapid thermal annealing and furnace annealing
MRS Advances·2022· 2 citedOpen Access
Scalable fabrication of metallic nanogaps using CMOS-based 10 nm spacer lithography
2022 IEEE 22nd International Conference on Nanotechnology (NANO)·2022· 1 cited
A7.3 pH Measurement System-on-Foil Aided with a Mixed Signal Processor
2021Open Access
Low-Noise Si-JFETs Enhanced by Split-Channel Concept
IEEE Transactions on Electron Devices·2020· 6 cited
Charge sensitive fluid sensor for chemical and biological applications
2017· 1 cited
Fast detection and identification of bacteria in potable water
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 1 cited
A NOVEL MOBILE MONITORING SYSTEM FOR FAST AND AUTOMATED BACTERIA DETECTION IN WATER
2009Open Access
Mikrobiologischer Trinkwassertest in weniger als einer Stunde
Optik & Photonik·2009· 1 cited
High quality strained Si/SiGe substrates for CMOS and optical devices
Microelectronic Engineering·2005· 2 cited
Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
Materials Science in Semiconductor Processing·2004
A Smart Sensor Device Realized in Standard CMOS-Technology based on an ASIC-Design
European Solid-State Device Research Conference·1995
A systematic investigation of the influence of processing parameters on the radiation hardness of reoxidized nitrided oxides
1995· 2 cited
Improved BESOI substrates for high speed ICs
1995
Radiation hard LOCOS field oxide
IEEE Transactions on Nuclear Science·1994· 6 cited
Interconnection scheme for improved high speed ICs
1994· 1 cited
Fabrication of High Quality MOS Devices for Application in Hazardous Environments Based on RTP Gate Dielectrics with In Situ RTCVD of Polysilicon Gates
MRS Proceedings·1993· 3 cited
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Frequent Co-authors

I. Eisele(7), H.P. Bruemmer(5), Peter Ramm(4), Christoph Kutter(3), Julian Weber(3), L. Nebrich(3), Robert Wieland(3), Christoph Heller(3), Ulrich Reidt(3), Andreas Helwig(3), Leonhard Meixner(3), Petra Lindner(3), Ramona Molz(3), Hans Wolf(3), Alois Friedberger(3), Jamila Boudaden(3), Leonhard Sturm-Rogon(2), B. Fröschle(2), Walter Lang(2), F. Bensch(2)