Kannan Seshadri

3M (United States) — United States

Engineering · Physical Sciences

12h-index1.0kcitations18works0.02yr avg
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Research Topics

Integrated Circuits and Semiconductor Failure Analysis(4), Semiconductor materials and devices(3), Optical Coatings and Gratings(3), Molecular Junctions and Nanostructures(2), Monoclonal and Polyclonal Antibodies Research(2)

Publications18 total

Salt tolerant membrane adsorbers for robust impurity clearance
Biotechnology Progress·2009· 30 cited
Design of salt‐tolerant membrane adsorbers for viral clearance
Biotechnology and Bioengineering·2009· 49 cited
Design techniques for Pulsed Static CMOS
2004· 1 cited
Potentiometry of an operating organic semiconductor field-effect transistor
Applied Physics Letters·2001· 122 cited
Spectroscopic Characterization of the Bonding, Orientation, and Coverage of Copper Tetraazaphthalocyanine Monolayer Films on SiO<sub>2</sub> Surfaces
The Journal of Physical Chemistry B·2000· 9 cited
Toward Controlled Area Electrode Assemblies:  Selective Blocking of Gold Electrode Defects with Polymethylene Nanocrystals
Langmuir·1999· 13 cited
Chemical control in fabrication of nanometer-scale structures on surfaces
1998
Synthesis of Crystalline, Nanometer-Scale, −(CH<sub>2</sub>)<i><sub>x</sub></i>− Clusters and Films on Gold Surfaces
Journal of the American Chemical Society·1997· 42 cited
High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1997· 38 cited
<i>n</i>-Alkylsiloxanes:  From Single Monolayers to Layered Crystals. The Formation of Crystalline Polymers from the Hydrolysis of<i>n</i>-Octadecyltrichlorosilane
Journal of the American Chemical Society·1997· 291 cited
Improved electron-beam patterning of Si with self-assembled monolayers
Applied Physics Letters·1996· 31 cited
High-resolution silicon patterning with self-assembled monolayer resists
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1996· 53 cited
Plasma etching with self-assembled monolayer masks for nanostructure fabrication
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1996· 43 cited
Sub-10 nm lithography with self-assembled monolayers
Applied Physics Letters·1996· 195 cited
Electron-Beam-Induced Damage in Self-Assembled Monolayers
The Journal of Physical Chemistry·1996· 115 cited
Investigations of V2O5—based LPG sensors
Talanta·1992· 4 cited
An Analog Hold Circuit
IETE Journal of Research·1972
An Orientation System for Balloon-Borne X-Ray Detector
IETE Journal of Research·1970

Frequent Co-authors

David L. Allara(10), Michael J. Lercel(6), Atul N. Parikh(4), H. G. Craighead(3), C.S. Whelan(3), H. G. Craighead(2), William Riordan(2), Kurt Brorson(2), Mark R. Etzel(2), A. S. Prakasarao(2), M. A. Schivley(1), Eunhae Koo(1), David J. Aurentz(1), Karl T. Mueller(1), C. Daniel Frisbie(1), K. D. Froyd(1), Harold G. Craighead(1), Steve Heilmann(1), Yi He(1), Sundar V. Atre(1)