Yejin Ku

Inha University — South Korea

Engineering · Physical Sciences

6h-index91citations21works1.32yr avg
OpenAlex↗Google Scholar↗Lab page↗

Accepting Students?

No reports yet. Know if this professor is taking students?

Research Topics

Advancements in Photolithography Techniques(12), Electron and X-Ray Spectroscopy Techniques(9), Nanofabrication and Lithography Techniques(4), Integrated Circuits and Semiconductor Failure Analysis(4), Gold and Silver Nanoparticles Synthesis and Applications(3)

Publications21 total

Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography
ACS Applied Materials & Interfaces·2025
Tin‐Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity
Advanced Functional Materials·2025
Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography (Adv. Funct. Mater. 24/2025)
Advanced Functional Materials·2025Open Access
Regioisomeric effects regulating the physicochemical properties of complex copolymers in thin films
European Polymer Journal·2025· 1 cited
Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography
Advanced Functional Materials·2025· 9 citedOpen Access
Positive-tone tin-oxo nanoclusters for extreme UV lithography
2025
Iodinated underlayer for enhanced chemically amplified resist performance
2025
Regioisomeric Effects Regulating the Physicochemical Properties of Complex Copolymers in Thin Films
SSRN Electronic Journal·2025Open Access
Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure
ACS Omega·2024· 3 citedOpen Access
Approach for enhancing sensitivity of tin-oxo cluster resist for high NA extreme UV lithography
2024· 1 cited
Sensitivity improvement of fluoroalkylated EUV resist with electron-rich vinyl units
2024
Dissolution Behavior of Fluoroalkylated Diazonaphthoquinone and Its Blends with Fluorinated Copolymers under UV Irradiation
Molecules·2023· 5 citedOpen Access
Fluoroalkylated tin-oxo nano clusters as resist candidates for extreme UV lithography
2023· 1 cited
Use of highly EUV absorbing element in chemically amplified resist
2023· 4 cited
Photoinduced Solubility Modulation in the Copolymers of Fluoroalkyl, Spiropyranyl, and Isobornyl Methacrylates
ACS Applied Polymer Materials·2023· 7 cited
Dendritic Polyphenol with an Improved Glass Transition Temperature for Microelectronic Applications
ACS Materials Letters·2023· 5 cited
Extreme UV Resist Exhibiting Synergism between Chemical and Physical Crosslinking Mechanisms
Langmuir·2023· 9 cited
Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA
RSC Advances·2022· 16 citedOpen Access
Highly Sensitive Electrochemical Sensor for Diagnosis of Diabetic Ketoacidosis (DKA) by Measuring Ketone Bodies in Urine
Sensors·2021· 14 citedOpen Access
Highly fluorinated alternating copolymer possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation
2021· 3 cited
page 1 of 2Next →

Frequent Co-authors

Jin‐Kyun Lee(21), Sangsul Lee(13), Gayoung Kim(12), Byeong‐Gyu Park(11), Byung Jun Jung(9), Chawon Koh(7), Hyun‐Taek Oh(6), Tsunehiro Nishi(5), Kanghyun Kim(4), Seohyeon Lee(4), Jiho Kim(4), Hyunwoo Kim(3), Subin Jeon(3), Choonghan Ryu(3), Kangho Park(3), Yun Lim Jung(3), Changyoung Jeong(3), Jin Choi(3), Myungwoong Kim(3), Yu Ha Jang(3)