Kenneth E. Gonsalves

Indian Institute of Technology Mandi — India

Engineering · Physical Sciences

35h-index4.0kcitations253works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(83), Integrated Circuits and Semiconductor Failure Analysis(44), Nanofabrication and Lithography Techniques(36), Electron and X-Ray Spectroscopy Techniques(27), Semiconductor materials and devices(26)

Publications253 total

Assisted Nanopatterning of Tin-based Inorganic Resist: Effect of Peripheral Functional Group Population on Resolution and Sensitivity
2024Open Access
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2023· 3 cited
Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application
ACS Applied Nano Materials·2023· 15 cited
Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications
Journal of Micro/Nanopatterning Materials and Metrology·2022· 4 cited
Macrocycle Network-Aided Nanopatterning of Inorganic Resists on Silicon
ACS Applied Nano Materials·2022· 12 cited
Organotin bearing polymeric resists for electron beam lithography
Microelectronic Engineering·2022· 14 cited
Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning
ACS Applied Electronic Materials·2021· 35 cited
Development of metal-organic cluster based negative tone resist: pre-screened through the helium-ion beam prelude to extreme ultraviolet lithography (EUVL) applications
2021· 2 cited
Resists for Helium Ion Beam Lithography: Recent Advances
ACS Applied Electronic Materials·2020· 24 cited
Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography
ACS Applied Nano Materials·2020· 12 cited
Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation
Applied Surface Science·2020· 25 cited
Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography
ACS Applied Materials & Interfaces·2020· 44 cited
Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography
ACS Applied Polymer Materials·2020· 47 cited
All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning
2020· 7 cited
Focusing on nanoparticles based photomultiplier in n-CARs
2020· 3 cited
Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications
Journal of Photopolymer Science and Technology·2018· 4 citedOpen Access
Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study
The Journal of Physical Chemistry C·2018· 4 cited
EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study
Journal of Photochemistry and Photobiology A Chemistry·2018· 24 cited
Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node
2018· 2 cited
Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications
2018· 3 cited
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Frequent Co-authors

Subrata Ghosh(9), Satinder K. Sharma(9), Chullikkattil P. Pradeep(7), Lhadi Merhari(4), Huixiang Wu(4), V. S. V. Satyanarayana(4), Wang Yueh(4), Xiaohe Chen(4), Sukun Zhang(3), Pulikanti Guruprasad Reddy(3), Vikram Singh(3), Mohamad G. Moinuddin(3), M. José-Yacamán(3), Tongsan D. Xiao(3), Marie‐Isabelle Baraton(3), Yue Hu(2), Song Jin(2), J. A. Cameron(2), Jianzhao Wang(2), Monica Rabinovich(2)