D. C. Jacobson

Engineering · Physical Sciences

51h-index11.8kcitations281works0.02yr avg
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Research Topics

Silicon and Solar Cell Technologies(149), Ion-surface interactions and analysis(110), Semiconductor materials and interfaces(73), Integrated Circuits and Semiconductor Failure Analysis(69), Thin-Film Transistor Technologies(59)

Publications281 total

A Journey to Machu Picchu
World Environmental and Water Resources Congress 2015·2015
The Viet Nam War Days: Tom as Teacher and Activist
Presses universitaires de la Méditerranée eBooks·2011Open Access
Thomas McGrath: Invoking the Communal Ego
Presses universitaires de la Méditerranée eBooks·2011
Improvement of productivity by cluster ion implanter: CLARIS
2010· 1 cited
Cluster Ion Implantation for beyond 45nm node novel device applications
2008
Beam Angular Divergence Effects in Ion Implantation
AIP conference proceedings·2008· 4 cited
Beam Current Improvements on the Axcelis Optima HD Imax Implanter
AIP conference proceedings·2008· 1 cited
Nissin’s New Cluster Implanter: CLARIS
AIP conference proceedings·2008· 2 cited
Increase of Carbon Substitutionality and Silicon Strain by Molecular Ion Implantation
ECS Meeting Abstracts·2007
Increase of Carbon Substitutionality and Silicon Strain by Molecular Ion Implantation
ECS Transactions·2007· 9 cited
Development of Nissin new boron cluster ion implanter
2007· 2 cited
Molecular and Cluster Ion Beams: Doping and Deposition with "Massive" Ions
Surrey Research Insight Open Access (The University of Surrey)·2006
45nm Node p+ USJ Formation With High Dopant Activation And Low Damage
2006· 9 cited
High Dopant Activation And Low Damage P+ USJ Formation
AIP conference proceedings·2006· 5 cited
Dose Retention Effects in Atomic Boron and ClusterBoron™ (B18H22) Implant Processes
AIP conference proceedings·2006· 3 cited
A Beam Line System for a Commercial Borohydride Ion Implanter
AIP conference proceedings·2006· 2 cited
Ultra-high resolution mass spectroscopy of boron cluster ions
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2005· 18 cited
Ultra-shallow junction formation by B18H22 ion implantation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2005· 41 cited
Using boron cluster ion implantation to fabricate ultra-shallow junctions
2005· 5 cited
Ridged LiNbO<tex>$_3$</tex>Modulators Fabricated by a Novel Oxygen-Ion Implant/Wet-Etch Technique
Journal of Lightwave Technology·2004· 39 cited
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Frequent Co-authors

J. M. Poate(37), D. J. Eaglesham(18), T. E. Haynes(8), H.‐J. Gossmann(7), Aditya Agarwal(6), J. M. Gibson(6), P.A. Stolk(5), Jürgen Michel(5), J. L. Benton(5), Lionel C. Kimerling(5), F. Spaepen(5), Michael O. Thompson(4), Alice E. White(4), H. S. Luftman(3), Eugene A. Fitzgerald(3), E. P. Donovan(3), R. T. Tung(3), J. S. Williams(3), George H. Gilmer(2), J. W. Mayer(2)