Stephen E. Potts

Louisiana State University — United States

Engineering · Physical Sciences

16h-index2.1kcitations36works0.02yr avg
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Research Topics

Semiconductor materials and devices(24), Catalytic Processes in Materials Science(11), Electronic and Structural Properties of Oxides(11), Metal and Thin Film Mechanics(10), Copper Interconnects and Reliability(5)

Publications36 total

Substrate and low intensity fires influence bacterial communities in longleaf pine savanna
Scientific Reports·2022· 9 citedOpen Access
Herbivory mediates direct and indirect interactions in long‐unburned chaparral
Ecological Monographs·2022· 5 citedOpen Access
Evaluation of GLM and GAM for estimating population indices from fishery independent surveys
Fisheries Research·2018· 42 cited
Pyrogenic fuels produced by savanna trees can engineer humid savannas
Ecological Monographs·2016· 62 cited
Atomic Layer Deposition of Silicon Nitride from Bis(<i>tert</i>-butylamino)silane and N<sub>2</sub> Plasma
ACS Applied Materials & Interfaces·2015· 103 citedOpen Access
Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO
Journal of Materials Chemistry C·2015· 63 citedOpen Access
Atomic Layer Deposition
Elsevier eBooks·2014· 88 cited
ChemInform Abstract: Energy‐Enhanced Atomic Layer Deposition for More Process and Precursor Versatility
ChemInform·2014
Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor
Chemistry of Materials·2013· 90 cited
Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using<sup>18</sup>O<sub>2</sub>Isotope Labeling
The Journal of Physical Chemistry C·2013· 12 cited
Electrical transport and Al doping efficiency in nanoscale ZnO films prepared by atomic layer deposition
Journal of Applied Physics·2013· 79 citedOpen Access
Energy-enhanced atomic layer deposition for more process and precursor versatility
Coordination Chemistry Reviews·2013· 102 cited
Room‐Temperature ALD of Metal Oxide Thin Films by Energy‐Enhanced ALD
Chemical Vapor Deposition·2013· 69 citedOpen Access
Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel
Thin Solid Films·2013· 31 cited
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
ECS Transactions·2013· 2 cited
Improving the Corrosion Protection Properties of Al<sub>2</sub>O<sub>3</sub> ALD Nanocoatings on Steel
ECS Meeting Abstracts·2012Open Access
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
ECS Meeting Abstracts·2012Open Access
Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-O<i>i</i>Pr)]2, as an alternative aluminum precursor
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2012· 76 citedOpen Access
New, Non-Pyrophoric Aluminium Precursor for the ALD of Al2O3: Influence of Purity Grade (Fe Content) on Silicon Surface Passivation
EU PVSEC·2012· 1 citedOpen Access
Plasma Atomic Layer Deposition
2011· 3 cited
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Frequent Co-authors

W. M. M. Kessels(24), Claire J. Carmalt(8), Hywel O. Davies(8), M. C. M. van de Sanden(7), Christopher S. Blackman(7), Harald B. Profijt(5), David Pugh(5), G. Dingemans(4), Belén Díaz(4), Jolanta Światowska(4), Vincent Maurice(4), Antoine Seyeux(4), Philippe Marcus(4), Harm C. M. Knoops(4), F. Roozeboom(4), Fawzi Abou‐Chahine(4), W. Keuning(3), E. Langereis(3), Robin Roelofs(3), Emma Härkönen(3)