Peter N. Heys

Engineering · Physical Sciences

16h-index611citations41works0.02yr avg
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Research Topics

Semiconductor materials and devices(18), Crystallization and Solubility Studies(9), X-ray Diffraction in Crystallography(9), Ferroelectric and Negative Capacitance Devices(9), Electronic and Structural Properties of Oxides(7)

Publications41 total

CCDC 783364: Experimental Crystal Structure Determination
The Cambridge Structural Database·2017Open Access
CCDC 783362: Experimental Crystal Structure Determination
The Cambridge Structural Database·2017Open Access
CCDC 783363: Experimental Crystal Structure Determination
The Cambridge Structural Database·2017Open Access
MOCVD of Vertically Aligned ZnO Nanowires Using Bidentate Ether Adducts of Dimethylzinc
Chemical Vapor Deposition·2011· 34 cited
Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition
Thin Solid Films·2011· 38 cited
Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct
Journal of Crystal Growth·2010· 2 cited
Investigation of New 2,5‐Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO<sub>2</sub>
Chemical Vapor Deposition·2010· 12 cited
A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen‐Donor Adducts of Dimethylzinc
Chemical Vapor Deposition·2010· 18 cited
CCDC 704351: Experimental Crystal Structure Determination
The Cambridge Structural Database·2010Open Access
CCDC 710796: Experimental Crystal Structure Determination
The Cambridge Structural Database·2010Open Access
CCDC 704352: Experimental Crystal Structure Determination
The Cambridge Structural Database·2010Open Access
CCDC 737297: Experimental Crystal Structure Determination
The Cambridge Structural Database·2010Open Access
The optical properties of vertically aligned ZnO nanowires deposited using a dimethylzinc adduct
Nanotechnology·2009· 16 cited
MOCVD and ALD of CeO<sub>2</sub> Thin Films using a Novel Monomeric Ce<sup>IV</sup> Alkoxide Precursor
Chemical Vapor Deposition·2009· 32 cited
Deposition of TiO<sub>2</sub> Films by Liquid Injection ALD using New Titanium 2,5-dimethylpyrrolyl Complexes
ECS Transactions·2009· 1 cited
Deposition of TiO<sub>2</sub> Thin Films by Liquid Injection ALD Using New 2,5-Dimethylpyrrolyl Titanium-Alkylamide and -Alkoxide Precursors
ECS Meeting Abstracts·2009Open Access
Bis(cyclopentadienyl) zirconium(IV) amides as possible precursors for low pressure CVD and plasma-enhanced ALD
Inorganica Chimica Acta·2009· 14 cited
CCDC 686525: Experimental Crystal Structure Determination
The Cambridge Structural Database·2009Open Access
CCDC 686526: Experimental Crystal Structure Determination
The Cambridge Structural Database·2009Open Access
Permittivity enhancement of hafnium dioxide high-κ films by cerium doping
Applied Physics Letters·2008· 75 cited
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Frequent Co-authors

Paul R. Chalker(26), Anthony C. Jones(20), John Bacsa(16), Rajesh Odedra(12), Paul A. Williams(11), Hywel O. Davies(11), Helen C. Aspinall(10), Kate Black(9), M. Werner(8), Kate Black(8), H. D. EMPSALL(8), Bernard L. Shaw(7), Jeffrey M. Gaskell(6), Paul O’Brien(6), Mohammad Afzaal(6), P. Taechakumput(5), Sobia Ashraf(5), P. Beahan(5), Sarah Hindley(5), Jaakko Niinistö(4)