Rémi Dussart

Université de Tours — France

Engineering · Physical Sciences

26h-index2.3kcitations356works5.22yr avg
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Research Topics

Plasma Diagnostics and Applications(149), Semiconductor materials and devices(111), Metal and Thin Film Mechanics(67), Copper Interconnects and Reliability(51), Silicon and Solar Cell Technologies(50)

Publications356 total

Chemistry in Cryogenic Etching: A Tutorial
Plasma Chemistry and Plasma Processing·2025
<i>(Invited)</i> Cryogenic Atomic Layer Etching of Silicon and Silicon Compounds
ECS Meeting Abstracts·2025
Chemistry in cryogenic etching: A tutorial
2025Open Access
Atomic Layer Etching of SiO<sub>2</sub> using CF<sub>4</sub> plasma in deposition mode at cryogenic temperature
SPIRE - Sciences Po Institutional REpository·2025
Black silicon microstructuring via plasma cryogenic etching for microfluidic applications in geoscience
Journal of Micromechanics and Microengineering·2025Open Access
Study of Experimental Breakdown Within Controlled Nanometer Scale Electrode Gaps: Evidence of Elementary Mechanisms
2025
Tutorial lecture : The chemistry of cryogenic etching
SPIRE - Sciences Po Institutional REpository·2025Open Access
Efficient Synthesis of 1‐Chloroimidazo[1,2‐ <i>a</i> :4,5‐ <i>c'</i> ]dipyridines, Versatile Synthons for Position‐1 Functionalisation with Various Reagents
ChemistryOpen·2025Open Access
Statistical study of dc breakdown in a nanometer electrode gap and evidence of elementary mechanisms
Physical review. E·2025Open Access
Cryogenic atomic layer etching of SiO<sub>2</sub> based on cyclic CF<sub>4</sub>/Ar plasma
Japanese Journal of Applied Physics·2025· 2 citedOpen Access
Cryogenic etching of SiO<sub> <i>x</i> </sub>F<sub> <i>y</i> </sub> and SiO<sub>2</sub> in SF<sub>6</sub>/H<sub>2</sub> plasma
Japanese Journal of Applied Physics·2025· 8 citedOpen Access
Cryo- Atomic Layer Etching of Si, SiO2 and Si3N4
SPIRE - Sciences Po Institutional REpository·2025
Cryogenic cyclical etching of Si using CF4 plasma passivation steps: The role of CF radicals
Applied Physics Letters·2025· 7 citedOpen Access
Enhanced physisorption of CF radicals on Si surfaces cooled at cryogenic temperature and application to deep etching
SPIRE - Sciences Po Institutional REpository·2024
Cryogenic etching of SiOxFy and SiO2 in SF6/H2 plasma
SPIRE - Sciences Po Institutional REpository·2024
Plasma Prize Award Talk: The Evolution of Cryogenic Etching Plasma Processes Since Their Introduction 35 Years Ago
SPIRE - Sciences Po Institutional REpository·2024
Discharge characteristics of silicon-based DC Helium microplasmas: comparison between Through Silicon Via and closed cavity type micro-reactors
Plasma Sources Science and Technology·2024· 3 citedOpen Access
Evaluation of Bosch processing and C<sub>4</sub>F<sub>8</sub> plasma deposition at cryogenic temperatures
Journal of Micromechanics and Microengineering·2024· 4 cited
Limits and interest of a low surface temperature for plasma etching processes
SPIRE - Sciences Po Institutional REpository·2024Open Access
SiC plasma etching technology processes for power and optoelectronic devices
SPIRE - Sciences Po Institutional REpository·2024Open Access
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Frequent Co-authors

Philippe Lefaucheux(29), Thomas Tillocher(27), Mohamed Boufnichel(14), P. Ranson(12), Nadjib Semmar(9), X. Mellhaoui(7), Lawrence Overzet(7), Anne‐Lise Thomann(7), Gaëlle Antoun(6), Kaoru Maekawa(6), C. B. Collins(5), F. Davanloo(5), Pierre‐Antoine Cormier(5), Jacky Mathias(5), Jean‐François de Marneffe(5), Jean‐Michel Pouvesle(5), M. C. Iosif(4), I. Popescu(4), V. I. Kirischuk(4), Thomas Lecas(4)