R. Divecha

Gynecologic Oncology Associates — United States

Engineering · Physical Sciences

7h-index281citations10works0.02yr avg
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Research Topics

Advanced Surface Polishing Techniques(6), Advancements in Photolithography Techniques(4), Advanced Measurement and Metrology Techniques(3), Electronic Packaging and Soldering Technologies(2), Semiconductor materials and devices(2)

Publications10 total

A Broad-Band Lumped Element Analytic Model Incorporating Skin Effect and Substrate Loss for Inductors and Inductor Like Components for Silicon Technology Performance Assessment and RFIC Design
IEEE Transactions on Electron Devices·2005· 36 cited
Using a statistical metrology framework to identify systematic and random sources of die- and wafer-level ILD thickness variation in CMP processes
2002· 46 cited
Capturing input switching dependency in crosstalk noise modeling
2002· 4 cited
Assessing and characterizing inter-and intra-die variation using a statistical metrology framework: A CMP case study
Computer Standards & Interfaces·1999· 14 cited
A Novel Statistical Metrology Framework for Identifying Sources of Variation in Oxide Chemical‐Mechanical Polishing
Journal of The Electrochemical Society·1998· 7 cited
Rapid characterization and modeling of pattern-dependent variation in chemical-mechanical polishing
IEEE Transactions on Semiconductor Manufacturing·1998· 138 cited
Wafer-scale modeling of pattern effect in oxide chemical mechanical polishing
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1997· 10 cited
EFFECT OF FINE-LINE DENSITY AND PITCH ON INTERCONNECT ILD THICKNESS VARIATION IN OXIDE CMP PROCESSES
1997· 19 cited
Using statistical metrology to understand pattern-dependent ILD thickness variation in oxide CMP processes
DSpace@MIT (Massachusetts Institute of Technology)·1997Open Access
Comparison of Oxide Planarization Pattern Dependencies between Two Different CMP Tools Using Statistical Metrology
1996· 7 cited

Frequent Co-authors

B.E. Stine(7), Duane S. Boning(7), Dennis O. Ouma(6), O.S. Nakagawa(5), Soo‐Young Oh(5), J.E. Chung(4), E. Chang(3), James E. Chung(3), Dale L. Hetherington(2), G.W. Ray(2), D.R. Bradbury(2), C.R. Harwoo(1), T. Maung(1), Keh-Jeng Chang(1), D. J. Bartelink(1), F.M. Rotella(1), Subhankar Singha(1), V. Blaschke(1), M. Matloubian(1), Andrew D. Brotman(1)