Yuuki Ishida

Engineering · Physical Sciences

23h-index1.8kcitations170works0.72yr avg
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Research Topics

Silicon Carbide Semiconductor Technologies(80), Semiconductor materials and devices(51), Silicon and Solar Cell Technologies(36), Thin-Film Transistor Technologies(32), GaN-based semiconductor devices and materials(27)

Publications170 total

Mapping the Path to Recovery: Analyzing Temporary Housing Projects for Lahaina Fire Survivors
2025Open Access
Survey for Detecting Cattle Persistently Infected with Bovine Viral Diarrhea Virus in Dairy Herds in Ibaraki Prefecture
Journal of the Japan Veterinary Medical Association·2024Open Access
Outbreaks of Highly Pathogenic Avian Influenza and Changing Strategies for the Culling of Laying Hens in Ibaraki Prefecture
Journal of the Japan Veterinary Medical Association·2024· 2 citedOpen Access
Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC
Journal of Applied Physics·2023· 3 citedOpen Access
Boron-Silicon Thin Film Formation Using a Slim Vertical Chemical Vapor Deposition Reactor
Advances in Chemical Engineering and Science·2023Open Access
Boron Doping Method using BCl 3 gas for Silicon Minimal CVD
The Japan Society of Applied Physics·2021
Boron Doping Method using BCl3 gas for Silicon Minimal CVD Film Formation
The Japan Society of Applied Physics·2021
Study of Device Process Using Minimal Ion Implantation Tool
The Japan Society of Applied Physics·2021
Chiroptical Properties of Cyclic Oligophenylene Extended with Cyclophane Derivative
The Chemical Society of Japan·2021
Wafer rotation effect on silicon epitaxial growth for minimal CVD reactor
The Japan Society of Applied Physics·2020
Development of Minimal Ion Implantation Tool (III)
The Japan Society of Applied Physics·2020
Gaseous species transport in Si minimal CVD reactor observed by QCM
The Japan Society of Applied Physics·2020
Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
Advances in Chemical Engineering and Science·2020· 4 citedOpen Access
Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor
Materials Science in Semiconductor Processing·2019· 2 cited
Silicon epitaxial growth using dichlorosilane for minimal CVD reactor
The Japan Society of Applied Physics·2019
Characteristics of H 2 -Syntering Process Using Minimal Focused Light Heating Furnace
The Japan Society of Applied Physics·2019
Real-time precursor transport observation in Si minimal CVD reactor by QCM
The Japan Society of Applied Physics·2019
Real time evaluation of silicon epitaxial growth process by exhaust gas measurement using quartz crystal microbalance
Materials Science in Semiconductor Processing·2018· 6 cited
Increasing silicon epitaxial growth rate for minimal CVD reactor
The Japan Society of Applied Physics·2018
Si minimal CVD process measurement by exhaust gas using quartz crystal microbalance
The Japan Society of Applied Physics·2018
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Frequent Co-authors

Hajime Okumura(34), Sadafumi Yoshida(14), Kazutoshi Kojima(11), Kazuo Arai(10), Tomoyuki Takahashi(10), Shigefusa F. Chichibu(9), S. Yoshida(8), Tetsuhiro Kitamura(6), Hidekazu Tsuchida(6), Hiroyuki Yaguchi(5), Shiyang Ji(5), Hideyuki Nakanishi(4), T. Sota(4), T. Koizumi(4), Sadafumi Yoshida Sadafumi Yoshida(4), Hitoshi Habuka(4), Toshiyuki Ohno(4), Mutsumi Sugiyama(3), Takeyoshi Onuma(3), Hiroshi Hamaguchi(3)