E. N. Zhikharev

Moscow Institute of Physics and Technology — Russia

Engineering · Physical Sciences

7h-index125citations28works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(16), Nanofabrication and Lithography Techniques(11), Semiconductor materials and devices(10), Electron and X-Ray Spectroscopy Techniques(7), Copper Interconnects and Reliability(6)

Publications28 total

Direct Monte-Carlo simulation of dry e-beam etching of resist
Microelectronic Engineering·2020· 8 cited
Simulation of dry e-beam etching of resist and experimental evidence
2019· 2 cited
Fabrication of microlens arrays and planar photonic crystals using thermal amplification of resist
Journal of Physics Conference Series·2018Open Access
Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins
Computer Optics·2017· 4 citedOpen Access
Dry e-beam etching of resist for optics
Journal of Physics Conference Series·2016· 1 citedOpen Access
Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle
Microelectronic Engineering·2016· 13 cited
Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist
Computer Optics·2015· 5 citedOpen Access
Some peculiarities of the new method of a relief creating by the direct electron-beam etching of resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014
A new method of formation of the masking image (relief) directly during the electron-beam exposure of the resist
Russian Microelectronics·2013· 3 cited
New method of forming a lithographic mask or relief directly during electron-beam exposure of a resist
Journal of Optical Technology·2013
The new dry method of mask (relief) formation by direct electron-beam etching of resist
Microelectronic Engineering·2013· 7 cited
Nanostructure of silicon-carbon composite thin films obtained using magnetron sputtering technique
Nanotechnologies in Russia·2011
Measurements of linear dimensions of silicon nanorelief elements with a near-rectangular profile by defocusing the electron probe of a scanning electron microscope
Russian Microelectronics·2010· 4 cited
The mechanism of formation and some properties of thin fluorocarbon films deposited onto silicon plates by electron-beam polymerization of hexafluoropropylene from the vapor phase
Polymer Science Series B·2010· 1 cited
Measurement of dimensions of resist mask elements below 100 nm with help of a scanning electron microscope
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 31 cited
New type of the nanostructured composite Si/C electrodes
Russian Journal of Electrochemistry·2008· 10 cited
The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam
Russian Journal of Physical Chemistry A·2008
Lithium insertion into silicon films produced by magnetron sputtering
Russian Journal of Electrochemistry·2008· 11 cited
Features of resist-free formation of masking pattern by electron beam-induced vapor deposition
High Energy Chemistry·2008
Properties of thin poly(tetrafluoroethylene) films deposited on solid substrates by electron beam polymerization from vapor phase
Polymer Science Series B·2008· 2 cited
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Frequent Co-authors

M.A. Bruk(24), V. A. Kal’nov(22), А. В. Спирин(18), A. E. Rogozhin(8), Dmitry R. Streltsov(7), I. A. Volegova(7), E.N. Teleshov(6), F. A. Sidorov(4), S. L. Shevchuk(4), Yu. P. Maishev(4), K. A. Valiev(3), Yu. E. Roginskaya(3), В. П. Гавриленко(2), A. V. Rakov(2), П. А. Тодуа(2), I. E. Kardash(2), Т. Л. Кулова(2), А. М. Скундин(2), N. V. Kozlova(2), Yu. A. Novikov(1)