M. Waiblinger

Carl Zeiss (Germany) — Germany

Chemistry · Physical Sciences

15h-index1.1kcitations42works0.02yr avg
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Research Topics

Fullerene Chemistry and Applications(19), Advancements in Photolithography Techniques(17), Electron and X-Ray Spectroscopy Techniques(14), Integrated Circuits and Semiconductor Failure Analysis(13), Graphene research and applications(9)

Publications42 total

Particle removal tool to repair particle defects on EUV reticles
2021· 4 cited
Photomask repair using low-energetic electrons
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 6 cited
Defect mitigation considerations for EUV photomasks
Journal of Micro/Nanolithography MEMS and MOEMS·2014· 11 cited
Bringing mask repair to the next level
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 10 cited
Ebeam based mask repair as door opener for defect free EUV masks
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 15 cited
The door opener for EUV mask repair
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 7 cited
Improving extreme UV lithography mask repair
SPIE Newsroom·2012· 1 cited
Closing the gap for EUV mask repair
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 27 cited
Repair of natural EUV reticle defects
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 42 cited
Imaging performance improvements by EUV mask stack optimization
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 10 cited
EUV mask stack optimization for enhanced imaging performance
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 11 cited
Increasing mask yield through repair yield enhancement utilizing the MeRiT
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 3 cited
e-beam induced EUV photomask repair: a perfect match
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 25 cited
EMCL 2010 Best Paper: E-beam induced EUV photomask repair: a perfect match
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010
High-resolution e-beam repair for nanoimprint templates
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 2 cited
Challenging defect repair techniques for maximizing mask repair yield
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 6 cited
Advanced process capabilities for electron beam based photomask repair in a production environment
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 7 cited
Corrected Article: Thermal stability of the endohedral fullerenes<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">N</mml:mi><mml:mi mathvariant="normal">@</mml:mi><mml:mi mathvariant="normal">C</mml:mi></mml:mrow><mml:mrow><mml:mn>60</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mo>,</mml:mo></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">N</mml:mi><mml:mi mathvariant="normal">@</mml:mi><mml:mi mathvariant="normal">C</mml:mi></mml:mrow><mml:mrow><mml:mn>70</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mo>,</mml:mo></mml:math>and<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">P</mml:mi><mml:mi mathvariant="normal">@</mml:mi><mml:mi mathvariant="normal">C</mml:mi></mml:mrow><mml:mrow><mml:mn>60</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>[Phys. Rev. B<b>63</b>, 045421 (2001)]
Physical review. B, Condensed matter·2001· 55 citedOpen Access
ChemInform Abstract: N@C<sub>60</sub> for Quantum Computing
ChemInform·2001
CHROMATOGRAPHIC SEPARATION OF N@C<sub>60</sub>/C<sub>60</sub>AND N@C<sub>70</sub>/C<sub>70</sub>MIXTURES
Fullerene Science and Technology·2001· 5 cited
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Frequent Co-authors

A. Weidinger(23), B. Pietzak(15), K. Lips(10), Andreas Hirsch(8), Klaus‐Peter Dinse(8), Klaus Edinger(8), Elke Dietel(6), Wolfgang Harneit(5), R. Jonckheere(5), T. Bret(5), Dieter Van den Heuvel(5), Norbert Weiden(4), Petra Spies(4), Anthony Garetto(4), Jens Oster(4), T. Almeida Murphy(3), B. Goedde(3), Peter Jakes(3), Gabriel G. Baralia(3), T. Hofmann(3)