Huaxing Sun

Nanjing Tech University — China

Engineering · Physical Sciences

18h-index910citations27works9.02yr avg
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Research Topics

Semiconductor materials and devices(11), Catalytic Processes in Materials Science(6), Organoboron and organosilicon chemistry(4), Copper Interconnects and Reliability(4), Electronic and Structural Properties of Oxides(4)

Publications27 total

Photoredox/Cu‐Catalyzed Decarboxylative C(sp<sup>3</sup>)−C(sp<sup>3</sup>) Coupling to Access C(sp<sup>3</sup>)‐Rich <i>gem</i>‐Diborylalkanes
Angewandte Chemie International Edition·2024· 16 citedOpen Access
Photoredox/Cu‐Catalyzed Decarboxylative C(sp<sup>3</sup>)−C(sp<sup>3</sup>) Coupling to Access C(sp<sup>3</sup>)‐Rich <i>gem</i>‐Diborylalkanes
Angewandte Chemie·2024· 3 citedOpen Access
Direct Synthesis of Tertiary Phosphines via Alkoxide-Mediated Deborylative Phosphination of Organoboronates
Organic Letters·2024· 8 cited
Facile preparation of organosilanes from benzylboronates and <i>gem</i> -diborylalkanes mediated by KO <sup> <i>t</i> </sup> Bu
Chemical Science·2023· 10 citedOpen Access
Platinum atomic layer deposition on metal substrates: A surface chemistry study
Surface Science·2018· 19 citedOpen Access
Electron-Enhanced Atomic Layer Deposition of Boron Nitride Thin Films at Room Temperature and 100 °C
The Journal of Physical Chemistry C·2018· 42 citedOpen Access
Efficient Capacitive Deionization Using Thin Film Sodium Manganese Oxide
Journal of The Electrochemical Society·2018· 14 cited
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2017· 28 cited
Atomic Layer Deposition of Zn(O,S) Alloys Using Diethylzinc with H<sub>2</sub>O and H<sub>2</sub>S: Effect of Exchange Reactions
The Journal of Physical Chemistry C·2017· 29 cited
Manifestation of the structural stability of Mg-doped Zn4Sb3 via atomic fine structure investigation
Solid State Communications·2017· 2 cited
Coating Solution for High-Voltage Cathode: AlF<sub>3</sub> Atomic Layer Deposition for Freestanding LiCoO<sub>2</sub> Electrodes with High Energy Density and Excellent Flexibility
ACS Applied Materials & Interfaces·2017· 84 cited
In Situ Engineering of the Electrode–Electrolyte Interface for Stabilized Overlithiated Cathodes
Advanced Materials·2017· 31 citedOpen Access
Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2016· 69 cited
Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °C Using Sequential Surface Reactions
Chemistry of Materials·2016· 47 citedOpen Access
Atomic Layer Deposition of Metal Fluorides Using HF–Pyridine as the Fluorine Precursor
Chemistry of Materials·2016· 73 cited
Sodium Charge Storage in Thin Films of MnO<sub>2</sub>Derived by Electrochemical Oxidation of MnO Atomic Layer Deposition Films
Journal of The Electrochemical Society·2015· 42 citedOpen Access
Surface Chemistry in Chemical Deposition of Manganese-Based Thin Films on Silicon Substrates
eScholarship (California Digital Library)·2013
Chemical Vapor Deposition of Manganese Metallic Films on Silicon Oxide Substrates
The Journal of Physical Chemistry C·2012· 28 cited
Activation of Metal–Organic Precursors by Electron Bombardment in the Gas Phase for Enhanced Deposition of Solid Films
The Journal of Physical Chemistry Letters·2012· 17 cited
Tuning Electron Transport in Graphene‐Based Field‐Effect Devices using Block Co‐polymers
Small·2012· 25 cited
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Frequent Co-authors

Steven M. George(9), Francisco Zaera(6), Xiangdong Qin(5), Weixin Huang(4), Jiefeng Hu(4), Kun Qian(3), Zhiquan Jiang(3), Matthias J. Young(3), Jaclyn K. Sprenger(3), Andrew S. Cavanagh(3), Young‐Hee Lee(2), Jasmine Wallas(2), Shanshan Lv(2), Jun Fang(2), Beibei He(2), Shiqiang Wei(2), Alexana Roshko(2), Mingming Huang(2), Florian Seufert(2), Alexandra Friedrich(2)