Rani S. Ghaida

Bellingham Technical College — United States

Engineering · Physical Sciences

11h-index275citations26works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(18), 3D IC and TSV technologies(9), VLSI and FPGA Design Techniques(8), Manufacturing Process and Optimization(4), Copper Interconnects and Reliability(4)

Publications26 total

Front Matter: Volume 9426
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 1 citedOpen Access
Hybrid OPC flow with pattern search and replacement
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 5 cited
Session details: Patterns and placement
International Conference on Computer Aided Design·2014
Pattern-restricted design at 10nm and beyond
2014· 2 cited
Comprehensive die-level assessment of design rules and layouts
2014· 10 cited
Framework for exploring the interaction between design rules and overlay control
Journal of Micro/Nanolithography MEMS and MOEMS·2013· 11 cited
A framework for exploring the interaction between design rules and overlay control
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 7 cited
Layout Decomposition and Legalization for Double-Patterning Technology
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems·2013· 28 cited
Role of Design in Multiple Patterning: Technology Development, Design Enablement and Process Control
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2013·2013· 8 cited
A methodology for the early exploration of design rules for multiple-patterning technologies
2012· 14 cited
DRE: A Framework for Early Co-Evaluation of Design Rules, Technology Choices, and Layout Methodologies
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems·2012· 27 cited
O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction
2012
<title>A novel methodology for triple/multiple-patterning layout decomposition</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 19 cited
A framework for double patterning-enabled design
International Conference on Computer Aided Design·2011· 13 cited
A framework for double patterning-enabled design
2011· 8 cited
Collaborative research on emerging technologies and design
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 1 cited
Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control
IEEE Transactions on Semiconductor Manufacturing·2010· 21 cited
Within-Layer Overlay Impact for Design in Metal Double Patterning
IEEE Transactions on Semiconductor Manufacturing·2010· 14 cited
Electrical Modeling of Lithographic Imperfections
2010· 17 cited
A framework for early and systematic evaluation of design rules
2009· 17 cited
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Frequent Co-authors

Puneet Gupta(19), Kanak Agarwal(5), Lars W. Liebmann(5), Xin Yuan(4), Sani Nassif(3), Payman Zarkesh-Ha(3), Mukul Gupta(3), Sani Nassif(2), George Torres(2), Yasmine Badr(2), Carl Babcock(2), Tuck-Boon Chan(1), Tanaya Sahu(1), Parag Kulkarni(1), Ken Doniger(1), Ning Jin(1), Piyush Chandra Verma(1), Shikha Somani(1), Ping Yang(1), Piyush Pathak(1)