S.-C. Chen

Taiwan Semiconductor Manufacturing Company (United States) — United States

Engineering · Physical Sciences

2h-index33citations6works0.02yr avg
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Research Topics

Semiconductor materials and devices(5), Advancements in Semiconductor Devices and Circuit Design(4), Integrated Circuits and Semiconductor Failure Analysis(2), Metal and Thin Film Mechanics(1), Laser Material Processing Techniques(1)

Publications6 total

Laser Scattering Microhaze Correlation with Polysilicon Surface Roughness and Impact on Electrical Performance
IEEE International Symposium on Semiconductor Manufacturing conference proceedings·2006
Optimization and scaling limit forecast of nitrided gate oxide using an equivalent nitride/oxide (N/O) stack model
2004· 2 cited
Electrical performance improvement in SiO/sub 2//HfSiO high-k gate stack for advanced low power device application
2004· 1 cited
Substrate-strained silicon technology: process integration [CMOS technology]
2004· 26 cited
Direct measurement of gate oxide damage from plasma nitridation process
2003
Characterization of plasma damage in plasma nitrided gate dielectrics for advanced CMOS dual gate oxide process
2003· 4 cited

Frequent Co-authors

C.-C. Chen(4), T.-L. Lee(3), Yinxi Jin(3), Mong Liang(3), L.G. Yao(2), M.-F. Wang(2), M.S. Liang(2), Vincent S. Chang(2), H.C.-H. Wang(1), Y.-P. Wang(1), S.-J. Chen(1), Chenjun Ge(1), S.M. Ting(1), Ji-Fu Kung(1), R.L. Hwang(1), Hua-Kung Chiu(1), Lawrence C. Sheu(1), Pei‐Kang Tsai(1), H.J. Tao(1), Yee‐Chia Yeo(1)