Takashi Saiki

Biochemistry, Genetics and Molecular Biology · Life Sciences

15h-index954citations63works0.02yr avg
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Research Topics

Enzyme Catalysis and Immobilization(15), Semiconductor materials and devices(12), Microbial Metabolic Engineering and Bioproduction(12), Enzyme Structure and Function(11), Enzyme Production and Characterization(10)

Publications63 total

Hayabusa2: Current Summary
82nd Annual Meeting of The Meteoritical Society·2019
Effects of Uremic Serum Residue on OATP1B1‐ and OATP1B3‐Mediated Pravastatin Uptake in OATP‐Expressing HEK293 Cells and Human Hepatocytes
Therapeutic Apheresis and Dialysis·2018· 5 cited
Prenatal Exposure to Tributyltin Decreases GluR2 Expression in the Mouse Brain
Biological and Pharmaceutical Bulletin·2017· 5 citedOpen Access
Space charge distribution measurement in corona discharged filler added polyimide films under DC stresses
2016· 1 cited
Space charge distribution measurements in insulating materials of commercially available enameled wire
2015· 4 cited
A 28-nm dual-port SRAM macro with active bitline equalizing circuitry against write disturb issue
2010· 31 cited
Current situation and future prospects of bio-ethanol.
Seibutsu Kogakkaishi/Seibutsu Kōgaku Kaishi·2009
A Vision-based Real-time Motion Capture System using Fast Model Fitting
Korea-Japan Joint Workshop on Frontiers of Computer Vision·2008· 2 cited
Dependence of Sheet Resistance of CoSi<sub>2</sub> with Gate Length of 30 nm on Thickness of Titanium Nitride Capping Layer in Co-Salicide Process
Japanese Journal of Applied Physics·2007· 5 cited
1st quantitative failure-rate calculation for the actual large-scale SRAM using ultra-thin gate-dielectric with measured probability of the gate-current fluctuation and simulated circuit failure-rate
2007· 5 cited
Dependence of CoSi<sub>2</sub> Sheet Resistance on Cobalt Thickness for Gate Lengths of 50 nm or Less
Japanese Journal of Applied Physics·2006· 4 cited
Direct Measurement of Offset Spacer Effect on Carrier Profiles in Sub-50 nm p-Metal Oxide Semiconductor Field-Effect Transistors
Japanese Journal of Applied Physics·2006· 1 cited
O202 Development and evaluation of ethanol production process from cellulosic biomass based on the highly efficient ethanol fermentation
バイオマス科学会議発表論文集·2006
Performance Boost using a New Device Design Methodology Based on Characteristic Current for Low-Power CMOS
2006· 15 cited
A novel strain enhanced CMOS architecture using selectively deposited high tensile and high compressive silicon nitride films
2005· 105 cited
Technology booster using strain-enhancing laminated SiN (SELS) for 65nm node HP MPUs
2005· 31 cited
Direct measurement of the offset spacer effect on the carrier profiles in sub-50 nm p-MOSFETs
2005
Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50 nm N-MOSFET by Scanning Tunneling Microscopy
Japanese Journal of Applied Physics·2004· 9 cited
MOSFET current drive optimization using silicon nitride capping layer for 65-nm technology node
2004· 38 cited
Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50nm N-MOSFET by Scanning Tunneling Microscopy
2003
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Frequent Co-authors

Κει Arima(18), Teruhiko Beppu(11), Gakuzo Tamura(8), Shinji Iijima(7), Teiiti Narasaki(5), Ryo Nakamura(4), Shuichi Satoh(4), Yoshimasa Takagi(4), Teruji Suzuki(4), Toshihiko Mori(3), Masataka Kase(3), Kouichi Hashimoto(3), T. Sugii(3), L G Ljungdahl(2), S. Pidin(2), S. Fukuta(2), Ryohei Kimura(2), Shingo Goto(2), Yoshio Takagi(2), M. Kojima(2)