Ranee W. Kwong

IBM (United States) — United States

Engineering · Physical Sciences

7h-index278citations52works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(47), Nanofabrication and Lithography Techniques(17), Semiconductor materials and devices(15), Advanced Surface Polishing Techniques(14), Copper Interconnects and Reliability(12)

Publications52 total

Track process monitoring via laser scattering imaging
2015
Under-layer effects for block levels: are they under control?
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 3 cited
Development of KrF hybrid resist for a dual-isolation application
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013
Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012
Developable BARC (DBARC) technology as a solution to today's implant lithography challenges
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 2 cited
Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 3 cited
Patternable low-кmaterial for “greener” semiconductor manufacturing
2010
Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line
Japanese Journal of Applied Physics·2010· 6 cited
Multilevel integration of patternable low-κ material into advanced Cu BEOL
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 3 cited
High-performance 193nm photoresists based on fluorosulfonamide
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 3 cited
Exploring Acidic Functionalities in the Design and Development of High Performance 193nm Photoresist Polymers
Journal of Photopolymer Science and Technology·2007Open Access
New 193nm top antireflective coatings for superior swing reduction
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 4 cited
Progress toward developing high performance immersion compatible materials and processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 4 cited
193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 11 cited
Fluoroalcohol-Methacrylate Resists for 193nm Lithography
Journal of Photopolymer Science and Technology·2005· 6 citedOpen Access
BEOL lithography for early development at the 65-nm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2004· 86 cited
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003· 2 cited
Rational design in cyclic olefin resists for sub-100-nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003· 11 cited
High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003· 6 cited
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Frequent Co-authors

Wu‐Song Huang(22), Wayne M. Moreau(14), Marie Angelopoulos(13), Karen Petrillo(12), Pushkara R. Varanasi(12), Margaret C. Lawson(11), Ahmad D. Katnani(11), Robert D. Allen(10), Arpan P. Mahorowala(9), David R. Medeiros(9), Ratnam Sooriyakumaran(9), Mahmoud Khojasteh(8), Christopher Magg(6), Robert Lang(6), Mark Slezak(6), Steven J. Holmes(6), Kuang‐Jung Chen(5), Wenjie Li(5), Harbans S. Sachdev(5), Ari Aviram(4)