Takaharu Nagai

Dai Nippon Printing (Japan) — Japan

Engineering · Physical Sciences

5h-index62citations22works0.52yr avg
OpenAlex↗Google Scholar↗Lab page↗

Accepting Students?

No reports yet. Know if this professor is taking students?

Research Topics

Advancements in Photolithography Techniques(18), Nanofabrication and Lithography Techniques(11), Electron and X-Ray Spectroscopy Techniques(6), 3D IC and TSV technologies(4), Advanced Surface Polishing Techniques(3)

Publications22 total

Extending resolution limit of EB lithography through material process co-optimization for nanoimprint templates
2025· 1 cited
Nanoimprint technology issue and outlook
2025· 1 cited
Development of repairing technology for nanoimprint templates by multiple patterning technology
2024
Development of nanoimprint templates by multiple patterning technology and its application
2024
Development of nanoimprint templates for dual damascene processing
2023
Nanoimprint template development by new fabrication method and its application
2021
Development of nanoimprint lithography templates toward high-volume manufacturing
Journal of Micro/Nanolithography MEMS and MOEMS·2016· 9 cited
HVM readiness of nanoimprint lithography templates: defects, CD, and overlay
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 18 cited
Evaluating Intracellular Crowded with a Glycine-Inserted Mutant Fluorescent Protein
Biophysical Journal·2014Open Access
Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 3 cited
Characterization of Antisticking Layers for UV Nanoimprint Lithography Molds with Scanning Probe Microscopy
Japanese Journal of Applied Physics·2010· 6 cited
Adhesion control between resist patterns and photomask blank surfaces
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009
Mask CD compensation method using diffraction intensity for lithography equivalent metrology
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008
Mask CD measurement approach by diffraction intensity for lithography equivalent
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008
Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 10 cited
Estimating DPL photomask fabrication load compared with single exposure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 2 cited
DPL performance analysis strategy with conventional workflow
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
Approach to analyze decomposition impact for photomask fabrication
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
Extendibility of single mask exposure for practical ArF immersion lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007
Pupil plane analysis on AIMS 45-193i for advanced photomasks
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 5 cited
page 1 of 2Next →

Frequent Co-authors

Naoya Hayashi(16), Yasutaka Morikawa(11), Hiroshi Mohri(11), Yuichi Inazuki(10), Nobuhito Toyama(10), Takanori Sutou(8), Hisayoshi Watanabe(6), Kouji Yoshida(5), Masaaki Kurihara(5), Takashi Adachi(5), Koji Ichimura(4), Hideki Cho(4), Saburo Harada(2), Sho Hatakeyama(2), Tatsuya Tomita(2), Morihisa Hoga(2), Hiroyuki Ohtani(2), Masamichi Fujihira(2), Kei Mesuda(2), Takanori Suto(2)