А. А. Лабуда

Oxford Instruments (United States) — United States

Engineering · Physical Sciences

4h-index185citations20works0.02yr avg
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Research Topics

Plasma Diagnostics and Applications(6), Semiconductor materials and devices(5), Force Microscopy Techniques and Applications(5), Mechanical and Optical Resonators(5), Fluid Dynamics and Turbulent Flows(2)

Publications20 total

Practical loss tangent imaging with amplitude-modulated atomic force microscopy
Journal of Applied Physics·2016· 56 cited
Quantitative Measurements of Electromechanical Response with a Metrological Atomic Force Microscope
arXiv (Cornell University)·2015· 2 citedOpen Access
Радиационная медицина= Radiation medicine
ГомГМУ eBooks·2014
Development of Electrochemical Cantilever Sensors for DNA Applications
ECS Transactions·2013· 2 cited
Development of Electrochemical Cantilever Sensors for DNA Applications
ECS Meeting Abstracts·2012Open Access
Comparison of photothermal and piezoacoustic excitation methods for frequency and phase modulation atomic force microscopy in liquid environments
AIP Advances·2011· 75 citedOpen Access
Optical detection system for probing cantilever deflections parallel to a sample surface
Review of Scientific Instruments·2011· 23 cited
Publisher's Note: “Optical detection system for probing cantilever deflections parallel to a sample surface” [Rev. Sci. Instrum. 82, 013701 (2011)]
Review of Scientific Instruments·2011
Improvement of the spatial resolution of the MicroPET R4 scanner by wobbling the bed
Medical Physics·2008· 22 cited
Improving the Spatial Resolution of the MicroPET Scanner by Wobbling the Bed
2006· 2 cited
Monochromatization of radiation for spectral control of plasma technological processes
Journal of Applied Spectroscopy·1998· 1 cited
Instability of the reactive magnetron sputtering process
Journal of Applied Spectroscopy·1996· 1 cited
Spectral investigation of the process of plasma etching of aluminum films
Journal of Applied Spectroscopy·1989· 1 cited
Spectral investigation of polymerization processes during the plasma etching of silicon films
Journal of Applied Spectroscopy·1981
The use of IR spectroscopy in studying the plasma chemical etching of silicon dioxide
Journal of Applied Spectroscopy·1981
Spectral methods of studying the mechanism and kinetics of the process of plasma-chemical destruction of photoresist
Journal of Applied Spectroscopy·1980
Spectral investigation of the plasma-chemical etching of silicon dioxide
Journal of Applied Spectroscopy·1979
Holographic-interferometry study of high-frequency temperature fluctuations in the stream of a vortical plasmatron
Journal of Engineering Physics and Thermophysics·1975
Holographic-interferometric study of high-frequency temperature pulsations of a jet produced in a vortex plasmatron
Inzhenerno Fizicheskii Zhurnal·1975
The method of holographic interferometry in real time is used to determine the temperature fluctuations of a subsonic turbulent stream of a nitrogen plasma which are caused by shunt- ing. The stream is generated by a vortical plasmatron.
1975

Frequent Co-authors

А. П. Бурмаков(5), Н. Н. Никифоренко(5), M. N. Bosyakov(4), Peter Grütter(3), V. M. Lutkovskii(3), Roger Proksch(2), T. Brastaviceanu(2), William Paul(2), Dilson E. Rassier(2), Christopher J. Thompson(2), Xueling Quan(2), Arto Heiskanen(2), Yi Sun(2), Anders Wolff(2), Jorge Jorge Dulanto(2), Anja Boisen(2), Kei Kobayashi(1), Daniel Kiracofe(1), Katsuyuki Suzuki(1), Hirofumi Yamada(1)