Yukinori Ochiai

The University of Tokyo — Japan

Engineering · Physical Sciences

38h-index3.8kcitations167works0.92yr avg
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Research Topics

Advancements in Photolithography Techniques(57), Ion-surface interactions and analysis(45), Integrated Circuits and Semiconductor Failure Analysis(41), Electron and X-Ray Spectroscopy Techniques(36), Nanofabrication and Lithography Techniques(35)

Publications167 total

Agile Prototyping of AI Hardware LSIs Using Multi-Layer Aluminum Interconnects in a Minimal Fab Environment
2025
An SoC Design and Fabrication Hands-On Educational Course within One Week Using Structured ASIC
2025
Can the Agile-Chip Platform Carve Out a Niche Between ASICs and FPGAs?
2025
ARIM-mdx Data System: Towards a Nationwide Data Platform for Materials Science
2024· 2 cited
Agile-X: A Structured-ASIC Created With a Mask-Less Lithography System Enabling Low-Cost and Agile Chip Fabrication
IEEE Transactions on Very Large Scale Integration (VLSI) Systems·2024· 4 cited
ARIM-mdx Data System: Towards a Nationwide Data Platform for Materials Science
arXiv (Cornell University)·2024Open Access
An Add-in Test Structure Chip to Unitedly Assess PVD Material Properties in University Open Nanotechnology Platform
2024
Test Structure to Assess Bump Shape Influence on Hybrid Bonding
2024· 1 cited
Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02
IEEJ Transactions on Sensors and Micromachines·2022
Two-pads per electrode in-situ test structure for micron-scale flip-chip bonding reliability of chip-on-chip device
2022· 1 cited
Test Structure of Bi-stable Spring towards TopoMEMS Ising Machine
2022· 4 cited
High Throughput 16 NM Nanogap by Variable Shaped Beam Method Using F7000S-VD02 EB Lithography
2021
Horizontally directional single-wall carbon nanotubes grown by chemical vapor deposition with a local electric field
Journal of Applied Physics·2007· 17 cited
Fabrication and transport property of artificial structure of CNTs using SPM nano-manipulation
AIP conference proceedings·2007
Characteristics and Modeling of Sub-10-nm Planar Bulk CMOS Devices Fabricated by Lateral Source/Drain Junction Control
IEEE Transactions on Electron Devices·2006· 38 cited
Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
Japanese Journal of Applied Physics·2006· 22 cited
Cell wall cutting tool and nano-net fabrication by FIB-CVD for subcellular operations and analysis
Microelectronic Engineering·2006· 33 cited
Comparison of FIB-CVD and EB-CVD growth characteristics
Microelectronic Engineering·2006· 33 cited
Inducing graphite tube transformation with liquid gallium and flash discharge
Applied Physics Letters·2006· 17 cited
Three-dimensional rotor fabrication by focused-ion-beam chemical-vapor-deposition
Microelectronic Engineering·2006· 36 cited
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Frequent Co-authors

Jun‐ichi Fujita(33), Shinji Matsui(18), Takashi Kaito(18), Masahiko Ishida(14), Kazuhiro Kanda(12), Yuichi Haruyama(12), Reo Kometani(10), M. Ishida(9), Takayuki Hoshino(8), T. Morita(7), Keiichiro Watanabe(7), S. Matsui(6), Toshitsugu Sakamoto(6), Satoshi� Matsui(6), K. Kondo(5), Toshinari Ichihashi(4), Masanori Komuro(4), T. Ichihashi(4), Eiichi Nomura(4), Hitoshi Wakabayashi(4)