Kazutake Taniguchi

Hoya (Japan) — Japan

Engineering · Physical Sciences

4h-index91citations12works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(6), Plasma Applications and Diagnostics(4), Plasma Diagnostics and Applications(4), Electron and X-Ray Spectroscopy Techniques(3), Nanofabrication and Lithography Techniques(3)

Publications12 total

Consolidated design approach to EUV mask blanks with TaBN based absorber
2023
Nanohole and dot patterning processes on quartz substrate by R–θ electron beam lithography and nanoimprinting
Japanese Journal of Applied Physics·2016· 5 cited
Master mold and working replica fabrication for nano-imprinting lithography for 1Tbit/inch<sup>2</sup>and 25nm pitch bit patterned media
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012
25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch&amp;lt;sup&amp;gt;2&amp;lt;/sup&amp;gt; bit patterned media
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012
Technique for estimating the angle of incidence and depth of focus of an electron beam
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2005· 1 cited
Performance improvement of diamondlike carbon membrane masks for electron projection lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2005· 1 cited
Fluorescence modulation of long DNA molecules adsorbed onto a microelectrode surface
Applied Physics Letters·2003· 3 cited
Generation of Integrated Atmospheric-Pressure Microplasmas
Japanese Journal of Applied Physics·2003· 15 cited
Fluorescence Emission Control of Long DNA Molecules Adsorbed on Microelectrode Surfaces by External Voltage
Japanese Journal of Applied Physics·2003· 1 cited
Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
Japanese Journal of Applied Physics·2003· 36 cited
Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
Japanese Journal of Applied Physics·2002· 25 cited
Capacitively Coupled Atmospheric Microplasma Source.
Shinku·2002· 4 citedOpen Access

Frequent Co-authors

Yasuhiro Horiike(6), Hiroyuki Yoshiki(4), Tsuyoshi Watanabe(3), Kota Suzuki(3), Hiromasa Iyama(3), Shuji Kishimoto(3), Takashi Satō(3), Hideo Kobayashi(3), Sakae Nakatsuka(3), Masanori Ueda(2), Yuzuru Takamura(2), Yoshinobu Baba(2), Isao Amemiya(2), Koichi Ikeda(1), Akihiro Wakaki(1), Seisuke Togashi(1), Takayuki Fukasawa(1), Hiroki Ogawa(1), Madoka Takai(1), Fumio Mizuno(1)