James F. Cameron

DuPont (United States) — United States

Engineering · Physical Sciences

28h-index8.3kcitations139works1.02yr avg
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Research Topics

Advancements in Photolithography Techniques(55), Photopolymerization techniques and applications(25), Planetary Science and Exploration(18), Integrated Circuits and Semiconductor Failure Analysis(16), Astro and Planetary Science(13)

Publications127 total

Disruptive non-fluorinated photoacid generators using computational chemistry and library design
2024· 2 cited
Core-coupled states excited in the /sup 208/Pb(d vector,t)/sup 207/Pb reaction. [17 MeV]
OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)·2024Open Access
Rusticle magnetotaxis elucidating Rustflower formations in RMS Titanic's Turkish Baths
Deep Sea Research Part I Oceanographic Research Papers·2023· 4 cited
Considerations in the design of photoacid generators
2023· 2 cited
Fundamental studies of interactions between polymer substrate and precursor in sequential infiltration synthesis
2023
Challenges and opportunities in material development and understanding that enables advanced photolithography
2023
Galactose-Based Block Copolymers with Switchable χ Parameters for Tuning Phase Separated Morphology
Macromolecules·2023· 2 cited
Photo/Thermal Dual Responses in Aqueous-Soluble Copolymers Containing 1-Naphthyl Methacrylate
Macromolecules·2021· 7 cited
Reducing the absorbance of a high etch resistant spin-on carbon hardmask
2021· 1 cited
Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates
2021· 1 cited
Design considerations for chemically amplified EUV resist materials
2021· 3 cited
Photo-directing chemoepitaxy: the versatility of poly(aryl methacrylate) films in tuning block copolymer wetting
Polymer Chemistry·2021· 1 cited
Planarized spin-on carbon hardmask
2020· 1 cited
Evolution of lithographic materials enabling the semiconductor industry
2019
High temperature spin on carbon materials with excellent planarization and CVD compatibility
2019
Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance
Macromolecules·2019· 44 cited
High-speed atomic force microscopy studies of 193-nm immersion photoresists during tetramethylammonium hydroxide development
Journal of Micro/Nanolithography MEMS and MOEMS·2018· 3 cited
Triphenylsulfonium topophotochemistry
Photochemical & Photobiological Sciences·2017· 15 cited
Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(μ-Me<sub>2</sub>pz)]<sub>2</sub> to Photo-Acid Generators
The Journal of Physical Chemistry A·2017
The Mars Science Laboratory (MSL) Mast cameras and Descent imager: Investigation and instrument descriptions
Earth and Space Science·2017· 167 citedOpen Access
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Frequent Co-authors

Gerd Pohlers(12), Jean M. J. Fréchet(11), James W. Thackeray(7), C. Grant Willson(6), M. A. Caplinger(5), Marcia I. Dawson(5), T. F. Bristow(4), D. F. Blake(4), S. J. Chipera(4), D. Y. Sumner(4), J. A. Crisp(4), K. S. Edgett(4), Magnus Pfahl(4), Aaron A. Rachford(4), Paul LaBeaume(4), Sheri L. Ablaza(4), George G. Barclay(4), D. T. Vaniman(3), D. L. Bish(3), D. W. Ming(3)