Tomoyuki Ando

Tokyo Ohka Kogyo (Japan) — Japan

Engineering · Physical Sciences

13h-index1.7kcitations45works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(22), Nanofabrication and Lithography Techniques(19), 3D IC and TSV technologies(9), Integrated Circuits and Semiconductor Failure Analysis(9), Electronic Packaging and Soldering Technologies(7)

Publications45 total

Reliability Studies of 5 µm Diameter Photo Vias with Daisy Chain Resistance Using Dry Film Photosensitive Dielectric Material
2018· 4 cited
Organic Damascene Process for 1.5-<inline-formula> <tex-math notation="LaTeX">$\mu$ </tex-math> </inline-formula>m Panel-Scale Redistribution Layer Technology Using 5-<inline-formula> <tex-math notation="LaTeX">$\mu$ </tex-math> </inline-formula>m-Thick Dry Film Photosensitive Dielectrics
IEEE Transactions on Components Packaging and Manufacturing Technology·2018· 15 cited
Demonstration of Embedded Cu Trench RDL using Panel Scale Lithography and Photosensitive Dry Film Polymer Dielectrics
IMAPSource Proceedings·2017
Via-in-Trench: A Revolutionary Panel-Based Package RDL Configuration Capable of 200-450 IO/mm/Layer, an Innovation for More-Than-Moore System Integration
2017· 12 cited
Next Generation Panel-Scale RDL with Ultra Small Photo Vias and Ultra-Fine Embedded Trenches for Low Cost 2.5D Interposers and High Density Fan-Out WLPs
2016· 13 cited
Demonstration of 20 um I/O Pitch RDL Using a Novel, Ultra-Thin Dry Film Photosensitive Dielectric for Panel-Based Glass Interposers
2016· 5 cited
Demonstration of 2µm RDL wiring using dry film photoresists and 5µm RDL via by projection lithography for low-cost 2.5D panel-based glass and organic interposers
2015· 11 cited
Challenges and approaches of ultra-fine pitch Cu pillar assembly on organic substrate using wafer level underfill
2013· 1 cited
Fine pitch Cu pillar wafer process development and seed layer etching characterization
2012· 3 cited
Immersion-Specific Defects of High-Receding-Angle Topcoat
Japanese Journal of Applied Physics·2010· 4 cited
Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 2 cited
Ammonia-treated carbon-supported cobalt tungsten as fuel cell cathode catalyst
Electrochimica Acta·2009· 43 cited
Pattern Freezing Process Free Litho–Litho–Etch Double Patterning
Japanese Journal of Applied Physics·2009· 6 cited
Topcoat-free ArF negative tone resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 6 cited
Pattern freezing process free litho-litho-etch double patterning
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 12 cited
Chemically amplified molecular resist based on fullerene derivative for nanolithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 11 cited
P19 Multivariate discrimination functions composed with amino acid profiles (Amino Index®) as a novel diagnostic marker for breast and colon cancer
European Journal of Cancer Supplements·2008
Mechanism of immersion specific defects with high receding-angle topcoat
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 2 cited
Reaction mechanism of fluorinated chemically amplified resists
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2006· 25 citedOpen Access
Defect studies of resist process for 193nm immersion lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 11 cited
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Frequent Co-authors

Hiroki Yamamoto(10), Takahiro Kozawa(10), Seiichi Tagawa(10), Mitsuru Satô(9), Kazumasa Okamoto(8), Hiroji Komano(7), Fuhan Liu(7), Venky Sundaram(7), Rao Tummala(7), Atsushi Kubo(6), Katsumi Ohmori(6), Atsuro Nakano(5), Kazuhiro Irie(5), Koichi Koshimįzu(5), Takeshi Takemura(5), Isao Sakata(5), Chandrasekharan Nair(5), Tetsuro Hanawa(5), Susumu Nakajima(4), Takeshi Iwai(4)