Benjamen M. Rathsack

Engineering · Physical Sciences

11h-index274citations29works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(21), Nanofabrication and Lithography Techniques(11), Integrated Circuits and Semiconductor Failure Analysis(6), Semiconductor materials and devices(5), Advanced optical system design(5)

Publications29 total

Driving DSA into volume manufacturing
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 14 cited
Driving DSA into volume manufacturing
Proceedings of SPIE - The International Society for Optical Engineering·2015
Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 18 cited
High-volume manufacturing equipment and processing for directed self-assembly applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 22 cited
DSA hole defectivity analysis using advanced optical inspection tool
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 3 citedOpen Access
Advances in directed self assembly integration and manufacturability at 300 mm
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 26 cited
Fabrication of 28nm pitch Si fins with DSA lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 25 cited
Pattern scaling with directed self assembly through lithography and etch process integration
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 53 cited
EUV RLS performance tradeoffs for a polymer bound PAG resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 13 cited
Bit Distribution and Reliability of High Density 1.5 V Ferroelectric Random Access Memory Embedded with 130 nm, 5 lm Copper Complementary Metal Oxide Semiconductor Logic
Japanese Journal of Applied Physics·2006· 15 cited
Resists for Mask Making
2005· 2 cited
Bit Distribution and Reliability of High Density 1.5V FRAM Embedded with 130nm, 5LM Copper CMOS Logic
2005
Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists
Chemistry of Materials·2004· 18 cited
An enhanced 90nm high performance technology with strong performance improvements from stress and mobility increase through simple process changes
2004· 21 cited
A high performance 90 nm logic technology with a 37 nm gate length, dual plasma nitrided gate dielectric and differential offset spacer
2003· 5 cited
CD variations from nontrivial mask-related factors
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002
Aerial image degradation effects due to imperfect sidewall profiles of EAPSM mask for 130-nm device node: 3D EMF simulations and wafer printing results
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002
Rational design of bleachable nonchemically amplified DUV photoactive compounds
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001· 1 cited
Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition
Texas ScholarWorks (Texas Digital Library)·2001· 3 cited
Process development for 257-nm photomask fabrication using environmentally stable chemically amplified photoresists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001· 3 cited
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Frequent Co-authors

C. Grant Willson(11), Mark Somervell(8), Cyrus Tabery(7), Takahiro Kitano(6), Seiji Nagahara(6), Koichi Yatsuda(5), Kathleen Nafus(5), Jeff A. Albelo(5), Makoto Muramatsu(4), Hiroyuki Iwaki(4), Ainhoa Romo Negreira(4), Tadatoshi Tomita(4), Shinichiro Kawakami(4), Steven Scheer(4), Timothy B. Stachowiak(4), Takashi Yamauchi(3), Soichiro Okada(3), Takanori Nishi(3), Etsuo Iijima(3), Makiko Dojun(3)