Cyrus Tabery

ASML (United States) — United States

Engineering · Physical Sciences

12h-index972citations67works0.92yr avg
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Research Topics

Advancements in Photolithography Techniques(59), Integrated Circuits and Semiconductor Failure Analysis(18), Electron and X-Ray Spectroscopy Techniques(16), Industrial Vision Systems and Defect Detection(16), Advanced Surface Polishing Techniques(10)

Publications67 total

Pupil, mask, wavefront co-optimization for enhanced EUV patterning: reducing LWR and evaluating overlay
2025
Stitching at high-NA EUV: a first experimental study
2025
Curvilinear OPC and mask data prep for high-NA lithography
2025
Electrical test demonstration for 0.55 NA EUV single patterning damascene process
2025
Probing defects in metal oxide resists with an electrical yield vehicle
2025· 1 cited
Characterization of grating asymmetries through multicolor EUV alignment simulation: process incoming analysis
2025· 1 cited
Via to metal line end process margin calibration by voltage contrast-based EPE process margin
2025· 2 cited
Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
Journal of Micro/Nanopatterning Materials and Metrology·2025· 3 cited
Assist features for extreme ultraviolet imaging in 0.55 numerical aperture
Journal of Micro/Nanopatterning Materials and Metrology·2024· 1 cited
Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
2024· 1 cited
High NA EUV stitching: mask performance is a key
2024· 1 cited
Patterning process and electrical yield optimization at the limits of single exposure EUV 0.33 NA: a pitch 26nm damascene process
2024
Overlay metrology performance of dry photoresist towards high-NA EUV lithography
2024
EUV OPC modeling of dry photoresist system for pitch 32nm BEOL
2024· 1 cited
Computational lithography and patterning evaluation to support EUV high-NA stitching
2024· 2 cited
Resolution and patterning performance quantification using efficient e-beam metrology
2023
Validation of imaging benefits of dual monopole exposures
2023· 4 cited
Alignment and overlay through opaque metal layers
2023· 2 cited
Predictive compact model for stress-induced on-product overlay correction
Journal of Micro/Nanopatterning Materials and Metrology·2022· 3 cited
Absolute overlay measurement with voltage contrast edge placement metrology
Metrology, Inspection, and Process Control XXXVI·2022· 2 cited
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Frequent Co-authors

Luigi Capodieci(6), Yi Zou(6), Chris Spence(6), Benjamen M. Rathsack(5), C. Grant Willson(5), Yunfei Deng(4), Sarah McGowan(4), Jongwook Kye(4), Harry Levinson(3), Lorena Page(3), Geng Han(3), Martin Burkhardt(3), Stefan Roling(3), Jeff A. Albelo(3), David del Rio(3), Natalia Davydova(3), Cecilia E. Philbin(3), Víctor M. Blanco Carballo(3), Christoph Hennerkes(3), Qian Xiang(2)