Kaori Miyazaki

University of Toyama — Japan

Engineering · Physical Sciences

8h-index222citations21works0.02yr avg
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Research Topics

Thin-Film Transistor Technologies(12), Silicon and Solar Cell Technologies(8), Silicon Nanostructures and Photoluminescence(8), Catalytic Processes in Materials Science(5), Catalysts for Methane Reforming(5)

Publications21 total

Corrigendum to “Effects of sputtering conditions on the activities of high-performance CO2 methanation catalysts prepared by a co-sputtering technique using the polygonal barrel system” [Appl. Catal. A: Gen. 597 (2020) 117557]
Applied Catalysis A General·2021
Structure-Sensitivity Factors Based on Highly Active CO<sub>2</sub> Methanation Catalysts Prepared via the Polygonal Barrel-Sputtering Method
The Journal of Physical Chemistry C·2020· 18 cited
Effects of sputtering conditions on the activities of high-performance CO2 methanation catalysts prepared by a co-sputtering technique using the polygonal barrel system
Applied Catalysis A General·2020· 8 cited
Structure-Sensitivity Factors Based on Highly Active CO₂ Methanation Catalysts Prepared via the Polygonal Barrel-Sputtering Method
The Journal of Physical Chemistry·2020· 1 cited
CO2 Methanation on Co-sputtered Ru–Metal Oxides Catalysts Prepared Using the Polygonal Barrel-Sputtering Method
Catalysis Letters·2018· 8 cited
A high-sensitivity broadband image sensor using CuInGaSe&lt;inf&gt;2&lt;/inf&gt; thin films
2008· 10 cited
High sensitivity and wide bandwidth image sensor using CuIn1−xGaxSe2 thin films
Thin Solid Films·2008· 7 cited
Field-effect a-Si:H solar cells with transparent conductive oxide comb-shaped electrodes
Thin Solid Films·2005· 6 cited
A pulsed laser ablation/plasma chemical vapor deposition tandem system for combinatorial device fabrication
Applied Physics A·2004· 3 cited
Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition
Japanese Journal of Applied Physics·2003· 2 cited
Concept and performance of a field-effect amorphous silicon solar cell
Semiconductor Science and Technology·2003· 15 cited
Photocatalytic properties of layered perovskite tantalates, MLnTa2O7 (M = Cs, Rb, Na, and H; Ln = La, Pr, Nd, and Sm)
Journal of Materials Chemistry·2003· 94 cited
Combinatorial Fabrication Process for a-Si:H Thin Film Transistors : Instrumentation, Measurement, and Fabrication Technology
Japanese Journal of Applied Physics·2001
Combinatorial Fabrication Process for a-Si:H Thin Film Transistors
Japanese Journal of Applied Physics·2001· 6 cited
Pulsed laser deposition of photosensitive a-Si thin films
Applied Physics A·1999· 12 cited
A novela-Si : H solar cell designed by two-dimensional device simulation
Bulletin of Materials Science·1999· 6 cited
Device simulation and fabrication of field effect solar cells
Bulletin of Materials Science·1999· 6 cited
An <i>ab initio</i> molecular-orbital study on hydrogen-abstraction reactions at the growing surface of hydrogenated amorphous silicon
Journal of Applied Physics·1998· 11 cited
Characteristics of field effect a-Si:H solar cells
Journal of Non-Crystalline Solids·1998· 7 cited
An ab-initio molecular-orbital analysis on the initial plasma CVD process of a-Si:H film on glass substrate
Thin Solid Films·1998· 1 cited
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Frequent Co-authors

Hideomi Koinuma(13), Nobuyuki Matsuki(8), Hiroshi Fujioka(8), Mitsuhiro Inoue(5), Baowang Lu(5), Asuka Shima(5), Yoshitsugu Sone(5), Takayuki Abe(5), Kenji Nakajima(4), Yoshiya Abiko(3), Kota Sato(3), Hiroyuki Shinno(3), Chulho Song(2), Yoshitake Honda(2), Masazumi Arao(2), Tsukuru Ohwaki(2), Masashi Matsumoto(2), Hideto Imai(2), Ren Peng(2), Toshiya Shibayanagi(2)