Mikko Utriainen

University of Eastern Finland — Finland

Engineering · Physical Sciences

21h-index1.1kcitations74works3.02yr avg
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Research Topics

Semiconductor materials and devices(25), Gas Sensing Nanomaterials and Sensors(12), Catalytic Processes in Materials Science(10), Advanced Chemical Sensor Technologies(10), Electronic and Structural Properties of Oxides(9)

Publications74 total

Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure using atomic layer deposition: A comparative study of surface composition and uniformity using x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry
Applied Surface Science·2024· 3 citedOpen Access
Erratum: “Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times” [Appl. Phys. Lett. <b>123</b>, 182902 (2023)]
Applied Physics Letters·2023Open Access
Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times
Applied Physics Letters·2023· 8 citedOpen Access
3D Thin Film Metrology without Cross-Sectional Sampling
2023
Optical metrology of 3D thin film conformality by LHAR chip assisted method
2022· 5 citedOpen Access
Evaluation of MEMS NIR Spectrometers for On-Farm Analysis of Raw Milk Composition
Foods·2021· 24 citedOpen Access
Evaluation of MEMS NIR spectrometers for on-farm analysis of raw milk composition
2021Open Access
Evaluation of MEMS NIR spectrometers for on-farm analysis of raw milk composition
Zenodo (CERN European Organization for Nuclear Research)·2021Open Access
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
2020Open Access
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
2020Open Access
Conformality of TMA/H2O and TMA/O3 processes evaluated using lateral high aspect ratio structures
2020
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
2020· 4 citedOpen Access
Conformality in Aluminum Oxide ALD Process Analyzed using 3rd Generation Silicon Based Lateral High Aspect Ratio Test Structures
2020
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
2020Open Access
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
2020Open Access
Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels
Physical Chemistry Chemical Physics·2020· 34 citedOpen Access
Correction to “Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO<sub>2</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub>”
The Journal of Physical Chemistry C·2019· 1 citedOpen Access
Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO<sub>2</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, and HfO<sub>2</sub>
The Journal of Physical Chemistry C·2019· 48 citedOpen Access
Thin film conformality analysis with microscopic PillarHall lateral high aspect ratio structures: uncertainty estimates
2019
On-farm quality analysis of raw milk: the potential of miniature spectrometers
2019
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Frequent Co-authors

Lauri Niinistö(15), Riikka L. Puurunen(13), Oili Ylivaara(6), Markku Ylilammi(5), Matti Pastell(5), Karsten Arts(4), W. M. M. Kessels(4), Harm C. M. Knoops(4), Aapo Varpula(4), С. В. Новиков(4), J. Sinkkonen(4), Jihong Yim(4), Virpi Korpelainen(4), Nora Haufe(4), Clemens Mart(4), Wenke Weinreich(4), L. Puurunen Riikka(4), Eero Haimi(3), Emma Verkama(3), Alireza M. Kia(3)