Carl E. Larson

IBM Research - Almaden — United States

Engineering · Physical Sciences

18h-index1.0kcitations59works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(39), Nanofabrication and Lithography Techniques(17), Semiconductor materials and devices(13), Integrated Circuits and Semiconductor Failure Analysis(11), Copper Interconnects and Reliability(9)

Publications59 total

Spin-on organic hardmask for topo-patterned substrate
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 9 cited
Investigation of pattern wiggling for spin-on organic hardmask materials
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 10 cited
Lithium Doping of Production Glasses
Ceramic engineering and science proceedings·2008
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 19 cited
Silicon containing polymer in applications for 193 nm high NA lithography processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 18 cited
The effect of photoresist/topcoat properties on defect formation in immersion lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 7 cited
Investigation of the current resolution limits of advanced EUVresists
2005· 2 citedOpen Access
Studies of acid diffusion in low Ea chemically amplified photoresists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 5 cited
Evaluation of functional properties of imaging materials for water immersion lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 7 cited
Design of Protective Topcoats for Immersion Lithography
Journal of Photopolymer Science and Technology·2005· 17 citedOpen Access
Sub-50nm half-pitch imaging with a low activation energy chemically amplified photoresist
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2004· 18 cited
193-nm negative resist based on acid-catalyzed elimination of polar molecules
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Combinitorial resist processing studies
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 5 cited
Optimized acid release underlayers for 157-nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Liquid immersion lithography: evaluation of resist issues
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 37 cited
Fluoropolymer platforms for 157 nm resist applications
2002
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
Applied Physics Letters·2002· 70 cited
Aliphatic platforms for the design of 157-nm chemically amplified resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 18 cited
Characterization and acid diffusion measurements of new strong acid photoacid generators
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 11 cited
Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 2 cited
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Frequent Co-authors

Gregory M. Wallraff(18), Robert D. Allen(16), William D. Hinsberg(12), Phillip J. Brock(11), Ratnam Sooriyakumaran(11), Gregory Breyta(10), Thomas H. Baum(9), Donald C. Hofer(9), Hoa D. Truong(8), Juliann Opitz(8), Frances A. Houle(7), John A. Hoffnagle(7), G. M. Wallraff(7), Greg Breyta(7), Karen Petrillo(7), Robert L. Jackson(6), Linda K. Sundberg(6), David R. Medeiros(6), Nicolette Fender(6), Arpan P. Mahorowala(6)