Gregory Breyta

IBM Research - Almaden — United States

Engineering · Physical Sciences

12h-index2.2kcitations33works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(25), Semiconductor materials and devices(14), Nanofabrication and Lithography Techniques(9), Integrated Circuits and Semiconductor Failure Analysis(7), Quantum Computing Algorithms and Architecture(4)

Publications33 total

Simple and cost-effective polycondensation routes to antimicrobial consumer products
Polymer Chemistry·2016· 15 cited
193-nm negative resist based on acid-catalyzed elimination of polar molecules
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Aliphatic platforms for the design of 157-nm chemically amplified resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 18 cited
Sensitivity factors of CAR electron-beam resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2002· 1 cited
Experimental Realization of Shor's quantum factoring algorithm
APS March Meeting Abstracts·2002· 2 cited
Mechanistic Studies of the Acidolysis Reactions Occurring in Silicon-Containing Bilayer Photoresists
Chemistry of Materials·2002· 3 cited
Experimental realization of Shor's quantum factoring algorithm using nuclear magnetic resonance
Nature·2001· 1.7k citedOpen Access
Polymer design for 157-nm chemically amplified resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001· 41 cited
Characterization of new aromatic polymers for 157-nm photoresist applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2001· 6 cited
Experimental Realization of an Order-Finding Algorithm with an NMR Quantum Computer
Physical Review Letters·2000· 157 citedOpen Access
Experimental realization of order-finding with a quantum computer
arXiv (Cornell University)·2000· 16 citedOpen Access
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000· 49 cited
Unitary control and systematic errors in NMR quantum computing
APS·2000
Experimental method for quantifying acid diffusion in chemically amplified resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 14 cited
Approaches to etch-resistant 193-nm photoresists: performance and prospects
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 3 cited
High-resolution 248-nm bilayer resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 9 cited
Polymer-platform-dependent characteristics of 193-nm photoresists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 2 cited
Progress in 193-nm Single Layer Resists: The role of Photoacid Generator Structure on the Performance of Positive Resists
ACS symposium series·1998· 2 cited
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists
ACS symposium series·1998
Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1997
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Frequent Co-authors

Carl E. Larson(11), Donald C. Hofer(11), Gregory M. Wallraff(10), Hiroshi Itô(10), Robert D. Allen(10), Phillip J. Brock(8), Ratnam Sooriyakumaran(8), Juliann Opitz(8), Lieven M. K. Vandersypen(5), Matthias Steffen(5), Costantino S. Yannoni(5), Mark Sherwood(5), Isaac L. Chuang(5), William D. Hinsberg(5), Richard A. Di Pietro(5), William R. Brunsvold(4), Debra Fenzel-Alexander(4), Karen Petrillo(4), Thomas I. Wallow(4), Richard A. DiPietro(4)