Ivan Pollentier

Imec the Netherlands — Netherlands

Engineering · Physical Sciences

18h-index1.3kcitations123works1.02yr avg
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Research Topics

Advancements in Photolithography Techniques(77), Electron and X-Ray Spectroscopy Techniques(47), Integrated Circuits and Semiconductor Failure Analysis(36), Semiconductor materials and devices(18), Semiconductor Lasers and Optical Devices(14)

Publications123 total

Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
Journal of Micro/Nanopatterning Materials and Metrology·2026
Author response for "Extreme Ultraviolet induced reactions of tin-oxo cage photoresists"
2026
Extreme ultraviolet induced reactions of tin–oxo cage photoresists
Journal of Materials Chemistry C·2026Open Access
Development of CNT pellicles for mass production and next generation EUV scanners
2025
Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy
ACS Applied Materials & Interfaces·2025· 1 citedOpen Access
Fundamental understanding of exposure and process chemistry for enhanced lithography and stability of metal oxide resists
2025· 2 citedOpen Access
BEFORCE: An advanced, versatile platform for unravelling and quantifying EUV photoresist chemistry during exposure, processing, and interaction with the environment
2025
Isolating the Role of Photoionization for Copolymer Present in Extreme Ultraviolet Photoresists by Gas Phase Electron–Ion Coincidence Experiments
ACS Applied Polymer Materials·2025· 2 cited
BEFORCE: a pathway to unravel metal oxide resist (MOR) reactions upon EUV exposure, bake, and environment
2024· 1 cited
Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source
Journal of Micro/Nanopatterning Materials and Metrology·2024· 2 citedOpen Access
Unraveling strength and mechanical properties of CNT-based EUV pellicle
2024· 3 cited
A scientific framework for establishing ultrafast molecular dynamic research in imec’s AttoLab
2023· 1 citedOpen Access
CNT pellicles: recent optimization and exposure results
2023· 8 cited
EUV pellicle scanner integration for N2 nodes and beyond
2023· 12 cited
Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Applied Surface Science·2022· 15 citedOpen Access
Exploring the synergy between EUV lithography and directed self-assembly
2022· 6 cited
To bake or not to bake... : the impact of prebake in the EUV resist process
2022
SIMS Analysis of Thin EUV Photoresist Films
Analytical Chemistry·2022· 16 cited
Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment
Journal of Micro/Nanopatterning Materials and Metrology·2021· 6 cited
Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
Journal of Micro/Nanopatterning Materials and Metrology·2021· 8 cited
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Frequent Co-authors

Emily Gallagher(12), Danilo De Simone(10), Marina Y. Timmermans(10), Peter Van Daele(8), Roel Gronheid(8), Cedric Huyghebaert(8), Geert Vandenberghe(8), Piet Demeester(7), Monique Ercken(6), Stefan De Gendt(6), R. Jonckheere(6), Jae Uk Lee(5), Christoph Adelmann(5), L. Buydens(4), Houman Zahedmanesh(4), Kris Baert(4), David Laidler(4), Mireille Maenhoudt(4), Kurt Ronse(4), Eric Hendrickx(4)