Danilo De Simone

IMEC — Belgium

Engineering · Physical Sciences

18h-index1.2kcitations173works2.22yr avg
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Research Topics

Advancements in Photolithography Techniques(161), Electron and X-Ray Spectroscopy Techniques(115), Integrated Circuits and Semiconductor Failure Analysis(112), Semiconductor materials and devices(15), Nanofabrication and Lithography Techniques(14)

Publications173 total

Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
Journal of Micro/Nanopatterning Materials and Metrology·2026
Process and materials compatibility considerations for introducing novel extreme ultraviolet resists in a fab: a guide for academia and entrepreneurs
Journal of Micro/Nanopatterning Materials and Metrology·2025
Advances of dry resist towards next-generation lines-spaces patterning in high-NA EUV lithography
2025· 1 cited
Understanding the impact of the EUV photon absorption distribution in a patterned EUV resist and its lithographic performance
2025· 1 cited
Impact of pixel size on unbiased roughness measurements of lines and spaces
Journal of Micro/Nanopatterning Materials and Metrology·2025
Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact
Journal of Micro/Nanopatterning Materials and Metrology·2025
Via to line-end contact failures: the role of stochastics
2025· 2 cited
E-beam metrology for high-NA: revisiting the imec protocol
2025· 1 cited
Fundamental understanding of exposure and process chemistry for enhanced lithography and stability of metal oxide resists
2025· 2 citedOpen Access
A comprehensive analysis to quantify the performance evolution of EUV photoresists
2025· 2 cited
Patterning performance of perfluoroalkyl substances (PFAS) free EUV chemically amplified resists: a step towards environmentally friendly lithographic chemicals
2025
PFAS free materials and resist for ArF immersion photolithography
2025
Author response for "Analysis of EUV Induced Depolymerization of Polyphthalaldehydes and Side Reactions for Dry Develop EUV Resist Applications"
2025
Thermal conductivity of underlayers for EUV lithography and its effect on sensitivity of metal oxide resist
2025
Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography
Japanese Journal of Applied Physics·2025· 4 citedOpen Access
Analysis of EUV induced depolymerization and side reactions of polyphthalaldehydes for dry develop EUV resist applications
Journal of Materials Chemistry C·2025· 1 citedOpen Access
Logic and memory patterning breakthrough using High-NA lithography
2024· 7 cited
PFAS-free EUV rinse for advanced technology nodes
2024· 1 cited
Substantial dose reduction using dry deposited underlayer for EUV lithography while maintaining roughness and minimizing defects
2024· 1 cited
Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology
2024· 1 cited
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Frequent Co-authors

Geert Vandenberghe(26), Yannick Vesters(11), Ivan Pollentier(10), Stefan De Gendt(8), Joren Severi(8), Gian F. Lorusso(8), Peter De Schepper(5), Jason K. Stowers(4), Ashish Rathore(4), Pieter Vanelderen(4), Christophe Béral(4), Philippe Foubert(4), John S. Petersen(4), Jing Jiang(4), Mohamed Saib(4), Anne-Laure Charley(4), Andrew Grenville(3), Benjamin L. Clark(3), Michael Kocsis(3), Stephen T. Meyers(3)