Andrew Grenville

Inpria (United States) — United States

Engineering · Physical Sciences

15h-index821citations71works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(43), Laser Material Processing Techniques(14), Optical Coatings and Gratings(13), Integrated Circuits and Semiconductor Failure Analysis(13), Electron and X-Ray Spectroscopy Techniques(11)

Publications71 total

Advances in defect performance in metal oxide photoresists for EUV lithography
2021· 3 cited
Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation)
2020· 3 cited
Advances in metal oxide resist performance and production (Conference Presentation)
2019· 3 cited
Population statistics of EUV printed MOx resist features (Conference Presentation)
2018· 1 cited
Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond
Journal of Micro/Nanolithography MEMS and MOEMS·2017· 12 citedOpen Access
Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet
Journal of Micro/Nanolithography MEMS and MOEMS·2016· 78 citedOpen Access
Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 41 cited
Dynamic absorption coefficients of CAR and non-CAR resists at EUV
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 30 citedOpen Access
Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 21 cited
What the Polls <i>Do</i> Show: Toward Enhanced Survey Readings of Religion in Canada
Canadian Review of Sociology/Revue canadienne de sociologie·2016· 6 cited
Integrated fab process for metal oxide EUV photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 80 cited
Coater/developer process integration of metal-oxide based photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 7 cited
Malleable conjoint partworths: How the breadth of response scales alters price sensitivity
Journal of Consumer Psychology·2012· 1 citedOpen Access
Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
Microelectronic Engineering·2012· 12 cited
The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 22 citedOpen Access
Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 2 cited
Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors
Applied Physics Letters·2011· 74 cited
Directly patterned inorganic hardmask for EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 64 cited
Photopatternable inorganic hardmask
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2010· 29 cited
Nanoimprinting for diffractive light trapping in solar cells
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2010· 16 cited
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Frequent Co-authors

M. Rothschild(18), Vladimir Liberman(14), Jason K. Stowers(13), Jan Sedláček(13), Michael Kocsis(10), Ray S. Uttaro(8), Benjamin L. Clark(7), Stephen T. Meyers(7), Peter De Schepper(6), Alan Telecky(6), S. T. Palmacci(6), Chris Van Peski(6), Douglas A. Keszler(5), Roderick R. Kunz(5), Chris K. Van Peski(5), Michael Greer(4), Danilo De Simone(4), Geert Vandenberghe(4), T. M. Bloomstein(4), D. E. Hardy(4)