Benjamin L. Clark

North Carolina State University — United States

Engineering · Physical Sciences

12h-index527citations28works2.02yr avg
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Research Topics

Advancements in Photolithography Techniques(9), Electron and X-Ray Spectroscopy Techniques(6), Integrated Circuits and Semiconductor Failure Analysis(6), Luminescence Properties of Advanced Materials(5), Semiconductor materials and devices(5)

Publications28 total

Design and Characterization of DNA-Driven Condensates: Regulating Topology, Mechanical Properties, and Immunorecognition
ACS Applied Materials & Interfaces·2025· 2 citedOpen Access
Advances in defect performance in metal oxide photoresists for EUV lithography
2021· 3 cited
Optimization of point-of-use filtration for metal oxide photoresist
2021· 1 cited
Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation)
2020· 3 cited
The Search for Rare Earth Elements and Yttrium (REY) in ChemCam Laser-Induced Breakdown Spectroscopy (LIBS) Data
LPI·2020
Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 41 cited
Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 21 cited
Integrated fab process for metal oxide EUV photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 80 cited
Coater/developer process integration of metal-oxide based photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 7 cited
<i>In‐situ</i> characterization of aqueous‐based hafnium oxide hydroxide sulfate thin films
Surface and Interface Analysis·2013· 12 cited
Coat-develop track process for inorganic EUV resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 4 cited
Directly patterned inorganic hardmask for EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 64 cited
Emerging LAN structures
Proceedings of WESCON '94·2002· 1 cited
Zn2GeO4:Mn alternating-current thin-film electroluminescent devices
Journal of Luminescence·2002· 57 cited
Low-Temperature Thin-Film Deposition and Crystallization
Science·2002· 99 cited
Spectroscopic and laser properties of Nd3+ in LaSc3(BO3)4 host
Journal of Applied Physics·2001· 24 cited
Electroluminescent and photoluminescent phosphor development and a facile approach to synthesis of refractory silicates at low temperatures
2001
Hydrothermal Dehydration of Precipitates:  Convenient Synthesis Method for Solids
Inorganic Chemistry·2001· 12 cited
Poster Session:Photo- and Electroluminescence in Zinc Germanate and Zinc Silicate Powders and ACTFEL Devices(1. 6th STDP概要報告)
Medical Entomology and Zoology·2001
Color Control in Sulfide Phosphors:  Turning up the Light for Electroluminescent Displays
Chemistry of Materials·1999· 36 cited
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Frequent Co-authors

Douglas A. Keszler(11), Andrew Grenville(7), Michael Kocsis(7), John F. Wager(6), Jason K. Stowers(6), Alan Telecky(6), Peter De Schepper(5), Stephen T. Meyers(4), Danilo De Simone(4), Geert Vandenberghe(4), Jeffrey P. Bender(3), Michael Greer(3), P. D. Keir(3), Thomas A. Reynolds(2), Gregory S. Herman(2), Jeremy T. Anderson(2), Joseph Edson(2), Kai Jiang(2), F. Lee Bailey(2), Russell A. Sherman(2)