G. Haindl

Technical University of Darmstadt — Germany

Physics and Astronomy · Physical Sciences

8h-index367citations18works0.02yr avg
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Research Topics

Semiconductor materials and interfaces(7), Semiconductor materials and devices(5), Chalcogenide Semiconductor Thin Films(5), Quantum Dots Synthesis And Properties(4), Copper Interconnects and Reliability(4)

Publications18 total

An optimized multilayer structure of CdS layer for CdTe solar cells application
Journal of Alloys and Compounds·2010· 32 cited
Optimized chemical bath deposited CdS layers for the improvement of CdTe solar cells
Solar Energy Materials and Solar Cells·2010· 113 cited
Annealing effects on the chemical deposited CdS films and the electrical properties of CdS/CdTe solar cells
Materials Research Bulletin·2010· 23 cited
CdTe thin film solar cells: Interrelation of nucleation, structure, and performance
Thin Solid Films·2008· 72 cited
In‐Situ Controlled Deposition of Thin Silicon Films by Hot‐Filament MOCVD with (C <sub>5</sub> Me <sub>5</sub> )Si <sub>2</sub> H <sub>5</sub> and (C <sub>5</sub> Me <sub>4</sub> H)SiH <sub>3</sub> as Silicon Precursors
2005
Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
Thin Solid Films·2004· 2 cited
Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers—X-ray comparative study
Physica B Condensed Matter·2001· 8 cited
Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy
Applied Physics A·2001· 1 cited
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Applied Physics A·2001· 50 cited
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
Microelectronic Engineering·2000· 13 cited
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2000· 6 cited
Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films
Chemical Vapor Deposition·2000· 4 cited
Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films
PUB – Publications at Bielefeld University (Bielefeld University)·2000
Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
Thin Solid Films·2000· 19 cited
W/Si multilayers deposited by hot-filament MOCVD
Thin Solid Films·1999· 3 cited
Carbon/titanium multilayers as soft-x-ray mirrors for the water window
Applied Optics·1998· 7 cited
Metal / Silicon Multilayers Produced by Low-Temperature MOCVD
MRS Proceedings·1998· 2 cited
Thermal stability of W1−xSix/Si multilayers under rapid thermal annealing
Journal of Applied Physics·1997· 12 cited

Frequent Co-authors

U. Kleineberg(13), U. Heinzmann(10), Frank Hamelmann(6), E. Majková(6), Andreas Klipp(6), Andreas Klein(4), A. Aschentrup(4), P. JUTZI(4), Š. Luby(4), Junfeng Han(3), Christina Spanheimer(3), Ganhua Fu(3), V. Krishnakumar(3), Kui Zhao(3), Wolfram Jaegermann(3), O. Wehmeyer(3), M. Jergel(3), L. Dreeskornfeld(3), P. Hudek(3), J. Hartwich(3)