P. Hudek

Engineering · Physical Sciences

16h-index1.0kcitations118works1.32yr avg
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Research Topics

Advancements in Photolithography Techniques(53), Advanced Surface Polishing Techniques(25), Integrated Circuits and Semiconductor Failure Analysis(21), Nanofabrication and Lithography Techniques(17), Advanced MEMS and NEMS Technologies(16)

Publications118 total

MBMW-401: a versatile tool for leading-edge EUV and high-NA EUV mask production
2025
MBMW 401 tool for 2nm and sub-2nm EUV masks
2025
Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography
Journal of Micro/Nanopatterning Materials and Metrology·2024· 4 citedOpen Access
New registration calibration strategies for MBMW tools by PROVE measurements
2022· 1 cited
Multi-beam mask writer exposure optimization for EUV mask stacks
Journal of Micro/Nanopatterning Materials and Metrology·2021· 10 cited
MBMW exposure optimization for EUV mask stacks
2021· 3 cited
Mask process correction validation for multi-beam mask lithography
2018· 8 cited
Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 2 cited
Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016
Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 5 cited
MEMS pressure sensor fabricated by advanced bulk micromachining techniques
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 1 cited
Bulk micromachining of SiC substrate for MEMS sensor applications
Microelectronic Engineering·2013· 39 cited
Laser ablation: A supporting technique to micromachining of SiC
2012· 2 cited
Mask aligner lithography simulation – From lithography simulation to process validation
Microelectronic Engineering·2012· 13 cited
Micromachined membrane structures for pressure sensors based on AlGaN/GaN circular HEMT sensing device
Microelectronic Engineering·2012· 33 cited
Fabrication process development for a high sensitive electrochemical IDA sensor
Microelectronic Engineering·2012· 11 cited
Material optimization of the alignment marks for the EBDW lithography
2010· 1 cited
Contact and proximity lithography using 193nm Excimer laser in Mask Aligner
Microelectronic Engineering·2009· 17 cited
Optimization of illumination pupils and mask structures for proximity printing
Microelectronic Engineering·2009· 10 cited
A suspended plate viscosity sensor featuring in-plane vibration and piezoresistive readout
Journal of Micromechanics and Microengineering·2009· 61 cited
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Frequent Co-authors

Ivo W. Rangelow(26), I. Kostič(14), F.G. Shi(9), P. Grabiec(8), Teodor Gotszalk(7), B. Volland(6), P. Dumania(5), Stefan Partel(5), H. Löschner(5), E. Majková(4), Dirk Beyer(4), G. Stangl(4), Joerg Butschke(4), H. Heerlein(3), Pavlina Choleva(3), Petr Mikulı́k(3), M. Jergel(3), Emil Pinčík(3), Š. Luby(3), W. Fallmann(3)