Trey Graves

Engineering · Physical Sciences

6h-index177citations33works1.02yr avg
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Research Topics

Advancements in Photolithography Techniques(31), Integrated Circuits and Semiconductor Failure Analysis(14), Electron and X-Ray Spectroscopy Techniques(13), Optical Coatings and Gratings(8), Advanced Surface Polishing Techniques(3)

Publications33 total

Optimization of EUV patterning using computational lithography for large-area stochastic hot spot prediction
2025· 1 cited
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
2023· 3 cited
On the origin and evolution of hotspots in multipatterning processes
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2023· 1 cited
OPC strategies to reduce failure rates with rigorous resist model stochastic simulations in EUVL
2019· 2 cited
Non‐Gaussian CD distribution characterization for DRAM application in EUV lithography
2018· 2 cited
Comparative stochastic process variation bands for N7, N5, and N3 at EUV
2018· 6 cited
Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 26 cited
Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016
Front Matter: Volume 9778
2016Open Access
Gaining insight into effective metrology height through the use of a compact CDSEM model for lithography simulation
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 4 cited
Quantifying imaging performance bounds of extreme dipole illumination in high A optical lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016
DSA graphoepitaxy calibrations for contact hole multiplication
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 5 cited
Topographic and other effects on EUV pattern fidelity
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014
Evaluating the effect of EUV multilayer buried defects on feature printability using a stochastic resist model
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013
Comprehensive EUV lithography model
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 12 cited
Impact of mask line roughness in EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 5 cited
Reflectivity metrics for optimization of anti-reflection coatings on wafers with topography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 1 cited
The impact of optical non-idealities in litho-litho-etch processing
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010
Methods for benchmarking photolithography simulators: part V
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010
リソ-リソ-エッチ工程における非理想的光学特性の影響
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010
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Frequent Co-authors

Mark D. Smith(21), John J. Biafore(18), Stewart A. Robertson(18), Alessandro Vaglio Pret(9), Chris A. Mack(6), Roel Gronheid(5), David Blankenship(5), Mark D. Smith(4), Kunlun Bai(3), Jeffrey D. Byers(3), Michael T. Reilly(2), Chao Fang(2), Jonggwan Lee(2), Anatoly Burov(2), Pradeep Vukkadala(2), Guy Parsey(2), Z. Cao(2), Janez Krek(2), Craig Higgins(2), Sergei Bakarian(2)