Chris A. Mack

Engineering · Physical Sciences

29h-index5.1kcitations435works0.62yr avg
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Research Topics

Advancements in Photolithography Techniques(275), Electron and X-Ray Spectroscopy Techniques(83), Integrated Circuits and Semiconductor Failure Analysis(71), Nanofabrication and Lithography Techniques(54), Surface Roughness and Optical Measurements(40)

Publications433 total

Predicting and measuring scummed contact holes
Journal of Micro/Nanopatterning Materials and Metrology·2025
Impact of pixel size on unbiased roughness measurements of lines and spaces
Journal of Micro/Nanopatterning Materials and Metrology·2025
E-beam metrology for high-NA: revisiting the imec protocol
2025· 1 cited
Etch process optimization to improve line edge roughness using precise stochastic process metrology
2025
Probabilistic process window analysis for EUV OPC model validation in advanced DRAM technology
2025
Via to line and line-end contact failures: modeling and the impact of stochastics
Journal of Micro/Nanopatterning Materials and Metrology·2025· 1 cited
Evaluating the probabilistic process window for use in high volume manufacturing
2024
Simulating SEM imaging of via bottoms
2024· 1 cited
Practical LWR sampling approaches for advanced patterning
2024
Modeling edge placement error performance of EUV and DSA multipatterning processes
2024· 3 cited
Advances in edge placement error metrology in the era of stochastics
2023· 1 cited
Improvements in the measurement of local critical dimension uniformity for holes and pillars
2023
Material science: biomimetic surface enhancement
The EYE GLAZ·2023· 1 citedOpen Access
Overlay and edge placement error metrology in the era of stochastics
2023· 7 cited
Special Section Guest Editorial: Advances in E-Beam Metrology
Journal of Micro/Nanopatterning Materials and Metrology·2023Open Access
Probabilistic process window: a new approach to focus-exposure analysis
Journal of Micro/Nanopatterning Materials and Metrology·2023· 2 cited
Unbiased roughness measurements from low signal-to-noise ratio scanning electron microscope images
Journal of Micro/Nanopatterning Materials and Metrology·2022· 3 cited
Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Journal of Micro/Nanopatterning Materials and Metrology·2022· 1 citedOpen Access
Writing a Good Scientific Paper
SPIE eBooks·2022Open Access
Low-voltage aberration-corrected SEM metrology of thin resist for high-NA EUVL
Metrology, Inspection, and Process Control XXXVI·2022· 3 cited
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Frequent Co-authors

Mark D. Smith(4), James W. Thackeray(3), John S. Petersen(3), Jeff D. Byers(3), Benjamin Bunday(3), Gian F. Lorusso(2), Vito Rutigliani(2), Frieda Van Roey(2), Daniel A. Miller(2), Wenlong Chang(1), Jining Sun(1), Xichun Luo(1), James Millar Ritchie(1), John J. Biafore(1), Roel Gronheid(1), Stewart A. Robertson(1), Trey Graves(1), David Blankenship(1), Burn J. Lin(1), John L. Sturtevant(1)