Takae Takeuchi

Osaka Gakuin University — Japan

Engineering · Physical Sciences

16h-index948citations113works0.62yr avg
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Research Topics

Ion-surface interactions and analysis(33), Mass Spectrometry Techniques and Applications(29), Semiconductor materials and devices(28), Thin-Film Transistor Technologies(18), Silicon Carbide Semiconductor Technologies(13)

Publications113 total

Identification of fragments from triethylamine and generation of molecular ions containing carbon and nitrogen
AIP Advances·2025· 1 citedOpen Access
Theoretical Studies of Gas Phase Ion Reactions in Mass Spectrometry
Journal of the Mass Spectrometry Society of Japan·2025Open Access
50 eV O+ ion induced deposition of tin dioxide using tetramethyltin
Heliyon·2025Open Access
Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane
AIP Advances·2024Open Access
Self-inhibition of growth and allelopathy through volatile organic compounds in Fusarium solani and Aspergillus fumigatus
PLoS ONE·2024· 1 citedOpen Access
Standard Definitions of Terms Related to Mass Spectrometry (Additional Edition 2024)
Journal of the Mass Spectrometry Society of Japan·2024Open Access
Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2024· 2 cited
Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation
AIP Advances·2023· 1 citedOpen Access
Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane
Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment·2023· 3 cited
Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane
Heliyon·2023· 8 citedOpen Access
Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate
Heliyon·2023· 4 citedOpen Access
Standard Definitions of Terms Related to Mass Spectrometry (Additional Edition 2023)
Journal of the Mass Spectrometry Society of Japan·2023Open Access
Injection of low-energy SiCH5+ ion-beam to Si substrate during chemical vapor deposition process using methylsilane
AIP Advances·2022· 2 citedOpen Access
Low-energy oxygen ion beam induced chemical vapor deposition using methylsilane or dimethylsilane for the formation of silicon dioxide films
Thin Solid Films·2022· 11 cited
Low-energy Ar+ ion beam induced chemical vapor deposition of silicon carbide films using dimethylsilane
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2022· 4 cited
Standard Definition of Terms Relating to Mass Spectrometry (Additional Edition 2022)
Journal of the Mass Spectrometry Society of Japan·2022Open Access
Low-energy O+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate for silicon dioxide film formation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2021· 7 cited
Low-energy O+ ion beam induced chemical vapor deposition using hexamethyldisilane or hexamethyldisilazane for silicon dioxide film formation
AIP Advances·2021· 8 citedOpen Access
Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films
PLoS ONE·2021· 8 citedOpen Access
2.3 Mass Spectrometries
IUPAC Standards Online·2021
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Frequent Co-authors

Masato Kiuchi(24), Satoru Yoshimura(15), Satoshi Sugimoto(15), Kensuke Murai(10), Takaomi Matsutani(7), Mitsuo Ishikawa(6), Joji Ohshita(5), Akinobu Naka(4), Tatsuya Asanuma(3), Atsutaka Kunai(3), Kichisuke Nishimoto(3), A. James McQuillan(2), Alexander G. Shard(2), Andrea E. Russell(2), Tomoaki Tanase(2), Kazuchika Ohta(2), Yoshinao Wada(2), Kyung Koo Lee(2), Wolfgang Schneider(2), Yutaka Harima(2)