Philipp Naujok

Materials Science · Physical Sciences

9h-index199citations29works0.02yr avg
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Research Topics

Electron and X-Ray Spectroscopy Techniques(13), Advanced X-ray Imaging Techniques(11), Advancements in Photolithography Techniques(10), Calibration and Measurement Techniques(5), Metal and Thin Film Mechanics(3)

Publications29 total

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal of Micro/Nanopatterning Materials and Metrology·2023· 12 citedOpen Access
On the optical constants of cobalt in the M-absorption edge region
Optik·2022· 2 citedOpen Access
Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet
Optical Materials Express·2022Open Access
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Applied Optics·2022· 3 citedOpen Access
Tantalum thin films EUVR data
Zenodo (CERN European Organization for Nuclear Research)·2022Open Access
Tantalum thin films EUVR data
2022· 1 citedOpen Access
Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
2022· 8 citedOpen Access
EUV optical constants data set
Zenodo (CERN European Organization for Nuclear Research)·2021Open Access
EUV optical constants data set
Zenodo (CERN European Organization for Nuclear Research)·2021Open Access
Determination of optical constants of thin films in the EUV
Zenodo (CERN European Organization for Nuclear Research)·2021Open Access
First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
2021· 6 cited
Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm – 23.75 nm
Optics Express·2021· 14 citedOpen Access
Optical constants for EUV scatterometry
2021
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Micro and Nano Engineering·2021· 13 citedOpen Access
Study of novel EUVL mask absorber candidates
Journal of Micro/Nanopatterning Materials and Metrology·2021· 23 cited
Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm
arXiv (Cornell University)·2021Open Access
Engineering novel mask absorber materials for next-generation EUVL
2020
Mask absorber for next generation EUV lithography
2020· 3 cited
Validation of optical constants in the EUV spectral range
2019· 4 cited
Struktur und optische Eigenschaften von Bor-basierten Schichtsystemen für den BEUV-Spektralbereich
Common Library Network (Der Gemeinsame Bibliotheksverbund)·2018Open Access
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Frequent Co-authors

Victor Soltwisch(17), Vicky Philipsen(17), Qais Saadeh(16), Meiyi Wu(14), Frank Scholze(13), Devesh Thakare(10), Karl Opsomer(10), Norbert Kaiser(7), Andreas Tünnermann(7), Christian Buchholz(7), Jean-Philippe Soulié(6), Christophe Detavernier(6), Christian Stadelhoff(5), Robert Müller(4), Richard Ciesielski(4), Robbert Wilhelmus Elisabeth van de Kruijs(4), Michael Kolbe(4), Jean‐François de Marneffe(3), Markus Foltin(3), Sergiy Yulin(3)