Chih-I Wei

Siemens (Belgium) — Belgium

Engineering · Physical Sciences

4h-index43citations16works0.52yr avg
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Research Topics

Advancements in Photolithography Techniques(16), Electron and X-Ray Spectroscopy Techniques(10), Integrated Circuits and Semiconductor Failure Analysis(10), Industrial Vision Systems and Defect Detection(5), Fault Detection and Control Systems(1)

Publications16 total

Low landing energy as an enabler for optimal contour based OPC modeling in the EUV era
2024· 1 cited
Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics
2024
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal of Micro/Nanopatterning Materials and Metrology·2023· 2 cited
Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing
2023· 4 cited
Importance sampling in Gaussian random field EUV stochastic model for quantification of stochastic variability of EUV vias
2023· 2 cited
EUV SRAFs printing modeling and verification in 2D hole array
2023· 1 cited
Compact modeling of stochastics and application in OPC
2023· 1 cited
Application of resolution enhancement techniques at high NA EUV for next generation DRAM patterning
2023· 3 cited
EUV SRAFs printing modeling with bright field mask
2022· 1 cited
Calibration of Gaussian random field stochastic EUV models
2022· 1 cited
E-beam metrology-based EUVL aberration monitoring
Metrology, Inspection, and Process Control XXXVI·2022
Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Japanese Journal of Applied Physics·2022· 5 cited
Better prediction on patterning failure mode with hotspot aware OPC modeling
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV·2021· 2 cited
Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
2020· 8 cited
Realizing more accurate OPC models by utilizing SEM contours
2020· 6 cited
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
2019· 6 cited

Frequent Co-authors

Germain Fenger(16), Azat Latypov(9), Werner Gillijns(9), Gurdaman Khaira(5), Peter De Bisschop(5), Sandip Halder(5), Kotaro Maruyama(4), Sayantan Das(4), Xima Zhang(4), Gian F. Lorusso(4), John L. Sturtevant(3), Neal Lafferty(3), Ir Kusnadi(3), Yosuke Okamoto(3), Yuichiro Yamazaki(3), Seul-Ki Kang(3), Shuling Wang(3), Shumay Shang(3), Rajiv Sejpal(2), Yunfei Deng(2)