Th. Groß

Materials Science · Physical Sciences

15h-index1.1kcitations40works0.02yr avg
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Research Topics

Electron and X-Ray Spectroscopy Techniques(20), X-ray Spectroscopy and Fluorescence Analysis(13), Zeolite Catalysis and Synthesis(8), Semiconductor materials and devices(7), Catalytic Processes in Materials Science(5)

Publications40 total

P7.1 - New Reference Material for Imaging XPS (X-ray Photoelectron Spectroscopy) Instrument Characterization
Proceedings SENSOR 2015·2015Open Access
Impact of high energy ball milling on the nanostructure of magnetite–graphite and magnetite–graphite–molybdenum disulphide blends
Materials Characterization·2013· 20 cited
Multimethod Chemical Characterization of Carbohydrate-Functionalized Surfaces
Journal of Carbohydrate Chemistry·2011· 12 cited
Ultra‐thin SiO <sub>2</sub> on Si IX: absolute measurements of the amount of silicon oxide as a thickness of SiO <sub>2</sub> on Si
Surface and Interface Analysis·2009· 43 cited
Critical review of the current status of thickness measurements for ultrathin SiO <sub>2</sub> on Si Part V: Results of a CCQM pilot study
Surface and Interface Analysis·2004· 139 cited
Ultra-thin SiO2 on Si, Part V: Results of a CCQM Pilot Study of Thickness Measurements
2003· 2 cited
Time-of-flight-SIMS and XPS characterization of metal doped polymers
Applied Surface Science·2002· 5 cited
Quantitative surface chemical analysis of stainless steel 1.4301 using Surface Science Instruments XPS spectrometers: report on an interlaboratory comparison
Surface and Interface Analysis·2002· 5 cited
Chemical and microstructural changes induced by friction and wear of brakes
Wear·2001· 230 cited
Standard operating procedure (SOP) for the quantitative determination of organic silicon compounds at the surface of elastomeric sealants
Applied Surface Science·2001· 5 cited
Uncertainty in measurement of overlayer thickness of thermally oxidized silicon using x‐ray photoelectron spectroscopy
Surface and Interface Analysis·2000
X-ray photoelectron spectroscopy and near-edge X-ray-absorption fine structure of C 60 polymer films
Applied Physics A·2000· 41 cited
Uncertainty in measurement of overlayer thickness of thermally oxidized silicon using x-ray photoelectron spectroscopy
Surface and Interface Analysis·2000· 15 cited
VAMAS TWA2 Project A2: evaluation of static charge stabilization and determination methods in XPS on non-conducting samples. Report on an inter-laboratory comparison
Surface and Interface Analysis·2000· 22 cited
The Use of Octadecyltrichlorosilane Self-Assembled Layers as a Model for the Assessment of Plasma Treatment and Metallization Effects on Polyolefins
Langmuir·1999· 42 cited
Reference materials for composition-depth profiles of TiN, Ti(C,N) and (Ti,Al)N with different chemical composition
Surface and Coatings Technology·1998· 9 cited
On the formation process of luminescing centers in spark-processed silicon
Journal of Applied Physics·1996· 18 cited
Temperature Control of a Microscope Freezing Stage for the Cryopreservation of Living Cells: Comparison of Two Different Concepts
Advances in cryogenic engineering·1996· 2 cited
98. Verfahren zur Kryokonservierung isolierter Herzmuskelzellen für die kardiophysiologische und pharmakologische Forschung
Chemie Ingenieur Technik·1994
Static charge correction in XPS on Cu-Zn-Al oxide catalyst precursors with the help of deposited Pd particles as a reference material
Applied Surface Science·1994· 14 cited
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Frequent Co-authors

Wolfgang E. S. Unger(17), Andreas Lippitz(10), U. Lohse(5), M. P. Seah(3), Hans‐Ulrich Danzebrink(3), Michael Krumrey(3), Dae Won Moon(3), W.A. Jordaan(3), Roland Hauert(3), Joseph A. Dura(3), E. Alsdorf(3), M. Feist(3), H.-J. Jerschkewitz(3), W. Österle(2), Μ. Ramm(2), H. Sonntag(2), Steven J. Spencer(2), Farid Bensebaa(2), I. Vickridge(2), W. Oesterle(2)