Rik Blumenthal

Auburn University — United States

Engineering · Physical Sciences

11h-index352citations36works0.02yr avg
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Research Topics

Plasma Diagnostics and Applications(11), Electron and X-Ray Spectroscopy Techniques(9), Ion-surface interactions and analysis(8), Advanced Chemical Physics Studies(5), Particle accelerators and beam dynamics(4)

Publications35 total

Finite element modeling of plasma initiation by carbon nanotubes (CNTs) as cold cathode in pseudospark switch
2014
Ultraviolet laser ablation of polycarbonate and glass in air
Journal of Applied Physics·2009
Strong synergistic effects in the combustion of propellants in H2 Plasmas
Journal of Applied Physics·2006· 2 cited
Role of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2006· 2 cited
Magnetic metal etching with organic based plasmas. I. CO∕H2 plasmas
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2005· 2 cited
Metal etching with organic based plasmas. II. CO∕NH3 plasmas
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2005· 11 cited
Nebulizing Spray Technique for Deposition of Propellant Thin Films
Journal of Propulsion and Power·2005· 1 cited
Supersonic Pulse, Plasma Sampling Mass Spectrometry: Theory and Practice
Plasma Chemistry and Plasma Processing·1999· 4 cited
Investigation of 4% carbon in hydrogen electron cyclotron resonance microwave plasmas using ethane as the source gas
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1999· 4 citedOpen Access
Distribution of species within an ethylene electron cyclotron resonance-microwave plasma
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1998· 4 cited
Mass spectrometric determination of the percent dissociation of a high-density chlorine plasma
Applied Physics Letters·1997· 8 citedOpen Access
Chemical reactions responsible for the plasma etching of silicon
1997
Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1997· 7 cited
The chemical composition of diamond plasmas
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1996· 5 cited
Applications of Scanning Tunneling Microscopy to Electrochemistry
1992· 2 cited
Angular distribution of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi mathvariant="normal">Ga</mml:mi></mml:mrow><mml:mrow><mml:mo>+</mml:mo></mml:mrow></mml:msup></mml:mrow></mml:math>ions desorbed by 3-keV-ion bombardment of GaAs{001}-(2×4)
Physical review. B, Condensed matter·1991· 21 cited
Arsenic coverage dependence of the angular distribution of secondary ions desorbed from the GaAs{001}(2×4) surface
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1991· 7 cited
Pulse Induced Nanolithography of Graphite in H2O: A Road to Chemical Linkages to the Surface?
AIP conference proceedings·1991· 1 cited
Angular distribution of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi mathvariant="normal">Ga</mml:mi></mml:mrow><mml:mrow><mml:mo>+</mml:mo></mml:mrow></mml:msup></mml:mrow></mml:math>ions desorbed by 3-keV ion bombardment of GaAs(110)
Physical review. B, Condensed matter·1990· 4 cited
Atom-scattering study of Ar+ ion damaged GaAs(110)
Surface Science Letters·1989
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Frequent Co-authors

S. F. Webb(7), Nicholas Winograd(6), L. J. Lanzerotti(5), W. Faissler(5), Patricia M. Joseph(5), G. A. Gaddy(5), D. C. Ehn(4), F. M. Pipkin(4), D.G. Stairs(4), K. P. Caffey(4), Ehud Furman(4), O. Van Dyck(4), S. Frankel(4), V. L. Highland(4), R. Werbeck(4), S. K. Donner(3), R. Trehan(3), J. K. Randolph(2), J. J. Russell(2), Jay M. Tenenbaum(2)