E. van der Drift

Engineering · Physical Sciences

26h-index2.6kcitations141works0.02yr avg
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Research Topics

Semiconductor materials and devices(42), Photonic Crystals and Applications(19), Physics of Superconductivity and Magnetism(18), Plasma Diagnostics and Applications(16), Optical Coatings and Gratings(16)

Publications141 total

Resilience and Risk Related to Mobile Health Applications: a case study of the G-Moji app
2018
Helium ion beam lithography of thick HSQ resists
TNO Repository·2012
Helium ion lithography principles and performance
Springer eBooks·2012· 1 cited
Highly Parallel Magnetic Tweezers by Targeted DNA Tethering
Nano Letters·2011· 118 cited
Helium Ion Lithography
Nanofabrication·2011· 13 cited
Nanofabrication with a High Resolution Helium Ion Beam
Microscopy and Microanalysis·2010· 4 citedOpen Access
Nanofabrication with a helium ion microscope
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 51 citedOpen Access
Helium Ion Beam Processing for Nano- fabrication and Beam-Induced Chemistry
2010· 2 cited
Wavelength tuning of planar photonic crystals by local processing of individual holes
Optics Express·2009· 18 citedOpen Access
Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2009· 4 citedOpen Access
Wavelength-sized cavities in high aspect InP/InGaAsP/InP photonic crystals
Journal of Applied Physics·2009· 2 citedOpen Access
Resonance frequency behavior of silicon nitride cantilevers as a function of pressure in different gas environments
2009· 1 cited
Wavelength-sized, tunable nanocavity in deeply etched InP/InGaAsP/InP photonic crystals
Optics Letters·2009· 4 citedOpen Access
Sub-10-nm nanolithography with a scanning helium beam
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2009· 134 citedOpen Access
Characterizing size-dependent effective elastic modulus of silicon nanocantilevers using electrostatic pull-in instability
Applied Physics Letters·2009· 152 citedOpen Access
Tuning of narrow-bandwidth photonic crystal devices etched in InGaAsP planar waveguides by liquid crystal infiltration
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009Open Access
Resist thickness effects on ultra thin HSQ patterning capabilities
Microelectronic Engineering·2009· 31 cited
Surface contamination-induced resonance frequency shift of cantilevers
2009· 4 cited
Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2008· 13 citedOpen Access
Comparative study of Cl2, Cl2∕O2, and Cl2∕N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2008· 18 citedOpen Access
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Frequent Co-authors

M. A. Blauw(10), Rebecca Cheung(10), H. W. M. Salemink(8), S. Radelaar(8), T. Zijlstra(6), Johan Nijs(5), K. G. Druijf(5), P. Balk(5), R. W. van der Heijden(5), B. Rong(5), P.J. French(4), Rob van der Heijden(4), Carl-Fredrik Carlström(4), F. Karouta(4), E.H.A. Granneman(4), Roger J. Reeves(4), Vadim Sidorkin(3), T. Zijlstra(3), Gabriel Crăciun(3), Willem G. Sloof(3)