E.H.A. Granneman

Engineering · Physical Sciences

21h-index1.4kcitations114works0.02yr avg
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Research Topics

Semiconductor materials and devices(28), Plasma Diagnostics and Applications(28), Particle accelerators and beam dynamics(24), Silicon and Solar Cell Technologies(22), Atomic and Molecular Physics(20)

Publications114 total

The effect of the second annealing step on the Ni1-xPtx:Si film thermal stability
Microelectronic Engineering·2017· 3 cited
PID and UVID Resistant n-Type Solar Cells and Modules
EU PVSEC·2016· 1 citedOpen Access
Selective Emitter in n-Type c-Si Solar Cells
EU PVSEC·2015· 3 citedOpen Access
NiPt Silicide Agglomeration Caused by Stress Relaxation along <010> Direction in NiSi Grain
2014
Optimization of Al2O3 Backside Passivation into Mass Production
EU PVSEC·2014Open Access
Advanced front-surface passivation schemes for industrial n-type silicon solar cells
2014· 2 cited
Dielectric Passivation Schemes for High Efficiency n-Type c-Si Solar Cells
EU PVSEC·2013· 2 citedOpen Access
Measurements on the energy loss of a relativistic electron beam in a plasma
2012· 1 cited
Analysis of blister formation in spatial ALD Al<inf>2</inf>O<inf>3</inf> for silicon surface passivation
2012· 19 cited
Improved performance of uncapped Al<inf>2</inf>O<inf>3</inf> and local firing-through Al-BSF in Bi-facial solar cells
2012· 2 cited
Spatial ALD Al2O3 Film Integrated in Low-Cost, High-Performance Bifacial Solar Cells
EU PVSEC·2012· 2 citedOpen Access
Industrial application of uncapped Al<inf>2</inf>O<inf>3</inf> and firing-through Al-BSF in open rear passivated solar cells
2011· 5 cited
High-Throughput Solar Cell Passivation on In-Line Levitrack ALD Al2O3 System - Demonstration of Process Performance
EU PVSEC·2011· 8 citedOpen Access
Surface Passivation for Industrial Solar Cells
EU PVSEC·2011Open Access
Excellent rear side passivation on multi-crystalline silicon solar cells with 20 nm uncapped Al<inf>2</inf>O<inf>3</inf> layer: Industrialization of ALD for solar cell applications
2010· 9 cited
Evaluation and Assessment of the ASPIRE Concept: A New Integrated mc-Si Cell and Module Design for High-Efficiencies
EU PVSEC·2010· 3 citedOpen Access
High-Throughput, In-Line ALD Al2O3 System
EU PVSEC·2010· 5 citedOpen Access
Electrical demonstration of thermally stable Ni silicides on Si1−xCx epitaxial layers
Microelectronic Engineering·2009· 5 cited
Wafer temperature measurement in conduction-based RTP systems
2008· 1 cited
Widening of FUSI RTP Process Window by Spike Anneal
2007
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Frequent Co-authors

P.W. van Amersfoort(11), M.J. van der Wiel(8), J. Los(7), H. J. Hopman(7), J.J.C. Geerlings(6), L.F.Tz. Kwakman(5), K. G. Druijf(5), Johan Nijs(5), E. van der Drift(5), P. Balk(5), M Klewer(5), F. Siebenlist(5), R. Thomae(5), H. Klein(5), A. Schempp(5), G. C. A. M. Janssen(4), Torben Weis(4), J. H. M. Bonnie(3), P. Vermont(3), J.N.M. Van Wunnik(2)