Takahisa Namiki

Tokyo University of Technology — Japan

Engineering · Physical Sciences

9h-index394citations30works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(9), Organic and Molecular Conductors Research(8), Semiconductor materials and devices(6), Magnetism in coordination complexes(6), Nanofabrication and Lithography Techniques(6)

Publications30 total

Coupling efficiencies in reflective self-organized lightwave network (R-SOLNET) simulated by the beam propagation method
IEEE Photonics Technology Letters·2005· 13 cited
Self-Organized Lightwave Network Based on Waveguide Films for Three-Dimensional Optical Wiring Within Boxes
Journal of Lightwave Technology·2004· 40 cited
28pPSA-37 Superconducting transition anomaly in the specific heat on the heavy-fermion PrOs_4Sb_
Meeting Abstracts of the Physical Society of Japan·2004
Anomalous Ordered State of Filled Skutterudite CeOs 4 Sb 12
Acta Physica Polonica B·2003· 33 cited
24aPS-78 Transport properties in UCoAl under uniaxial pressure(24aPS 4f・5f電子系,重い電子系,領域8(強相関系分野-高温超伝導,強相関f電子系など))
日本物理学会講演概要集·2002
De Haas-van Alphen Effect in CeRu_4Sb_
Meeting abstracts of the Physical Society of Japan·2001
High-performance EB chemically amplified resists using alicyclic protective groups
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000· 2 cited
High-performance chemically amplified positive electron-beam resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999
26p-PSA-24 Anomalous magnetic behaviour in Gd_2PdSi_3 single crystal.
日本物理学会講演概要集·1998
A New Single-Layer Resist for 193-nm Lithography
Japanese Journal of Applied Physics·1996· 9 cited
<title>Environmentally stable chemically amplified resist effects of organic salt additives</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1995
Characteristics of Silicon-Based Negative Resists in ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology·1995· 3 citedOpen Access
Author Index / Subject Index
Hormone Research·1994Open Access
Polysilphenylenesiloxane Resist with Three-Dimensional Structure
ACS symposium series·1993· 1 cited
A Bi-Level Resist System with a Conductive Bottom Layer for EB Lithography.
Journal of Photopolymer Science and Technology·1993Open Access
Three-Dimensional Silphenylene Resists for Excimer Laser Lithography.
Journal of Photopolymer Science and Technology·1991· 4 citedOpen Access
Low-drive-voltage Ti:LiNbO3 Mach-Zehnder modulator using a coupled line
1990· 6 cited
Polysilphenylenesiloxane Bi-level resist. TSPS.
Journal of Photopolymer Science and Technology·1990· 1 citedOpen Access
Fabrication and Operating Characteristics of Ion-Implanted Bubble Memory Chips for a 16M-Bit Device
IEEE Translation Journal on Magnetics in Japan·1989
Fabrication and operating characteristics of ion-implanted bubble memory chips for a 16M bit device.
Journal of the Magnetics Society of Japan·1988Open Access
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Frequent Co-authors

Kôichi Kikuchi(8), Isao Ikemoto(6), Ei Yano(6), Kazuya Saito(4), Keizo Murata(4), Keiji Kobayashi(4), Koji Nozaki(4), Keiji Watanabe(4), Miwa Igarashi(4), Takehiko Ishiguro(3), Keiji Kobayashi(3), Yoshiaki Honda(3), Yuji Aoki(3), Hitoshi Sugawara(3), Hideyuki Sato(3), Yohko Kuramitsu(3), Tomoyuki Yoshimura(2), Y. Arai(2), K. Asama(2), Edgar Toshiro Yano(2)