Robert J. Rafac

Physics and Astronomy · Physical Sciences

15h-index1.0kcitations51works0.02yr avg
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Research Topics

Advanced Frequency and Time Standards(18), Cold Atom Physics and Bose-Einstein Condensates(16), Atomic and Molecular Physics(16), Advancements in Photolithography Techniques(11), Laser Design and Applications(10)

Publications51 total

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)
2019· 2 cited
NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W
2018· 2 cited
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
2018· 41 cited
Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)
2017· 9 cited
Laser produced plasma light source development for HVM
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 9 cited
LPP EUV source readiness for NXE 3300B
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 22 cited
High power 120W ArF immersion XLR laser system for high dose applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 2 cited
CO<sub>2</sub>/Sn LPP EUV sources for device development and HVM
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 7 cited
High power EUV LPP
2013
Laser pulse shaping via extremum seeking
Control Engineering Practice·2012· 49 cited
Laser produced plasma EUV sources for device development and HVM
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 17 cited
High-range laser light bandwidth measurement and tuning
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 3 cited
Laser Pulse Shaping via Iterative Learning Control and High-Dimensional Extremum Seeking
2011· 6 cited
Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 3 cited
Effects of laser bandwidth on OPE in a modern lithography tool
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 21 cited
Active spectral control of DUV light sources for OPE minimization
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 10 cited
XLA-200: the third-generation ArF MOPA light source for immersion lithography
Optical Microlithography XVIII·2005· 2 cited
Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 6 cited
/sup 199/Hg/sup +/ optical frequency standard: progress report
2003· 2 cited
Laser metrology with subHertz lasers
2003
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Frequent Co-authors

Jonas Bergquist(15), Carol E. Tanner(15), Wayne M. Itano(14), D. J. Wineland(11), Daniel J. Brown(10), B.C. Young(9), Igor V. Fomenkov(9), James A. Beall(8), David C. Brandt(8), A. A. Schafgans(7), Alex I. Ershov(7), G. Vaschenko(7), Flávio C. Cruz(7), Yezheng Tao(6), Silvia De Dea(6), Michael Purvis(5), David W. Myers(5), Wayne J. Dunstan(5), Robert Bergstedt(5), Diana DiBerardino(5)