Juhae Park

Chonnam National University — South Korea

Materials Science · Physical Sciences

5h-index107citations14works0.02yr avg
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Research Topics

Block Copolymer Self-Assembly(10), Machine Learning in Materials Science(6), Advanced Polymer Synthesis and Characterization(5), Polymer Surface Interaction Studies(3), Advancements in Photolithography Techniques(3)

Publications14 total

Prediction of Diblock Copolymer Morphology via Machine Learning
arXiv (Cornell University)·2023Open Access
Prediction of Diblock Copolymer Lamellar Morphologies in 3D and Complex Geometry via Machine Learning
2023Open Access
Prediction of Diblock Copolymer Lamellar Morphologies in 3D and Complex Geometry via Machine Learning
2023Open Access
Prediction of Diblock Copolymer Lamellar Morphologies in 3D and Complex Geometry via Machine Learning
Zenodo (CERN European Organization for Nuclear Research)·2023Open Access
Prediction of Diblock Copolymer Lamellar Morphologies in 3D and Complex Geometry via Machine Learning
2023Open Access
Prediction of Diblock Copolymer Lamellar Morphologies in 3D and Complex Geometry via Machine Learning
Zenodo (CERN European Organization for Nuclear Research)·2023Open Access
Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations
Polymers·2023· 4 citedOpen Access
Coarse-Grained Simulation of Bottlebrush: From Single-Chain Properties to Self-Assembly
ACS Macro Letters·2022· 12 cited
Synthesis and Self-Assembly of Poly(vinylpyridine)-Containing Brush Block Copolymers: Combined Synthesis of Grafting-Through and Grafting-to Approaches
Macromolecules·2022· 11 cited
Mesoscale Simulations of Polymer Solution Self-Assembly: Selection of Model Parameters within an Implicit Solvent Approximation
Polymers·2021· 7 citedOpen Access
Molecular Weight Dependent Morphological Transitions of Bottlebrush Block Copolymer Particles: Experiments and Simulations
ACS Nano·2021· 50 cited
An Ultra-Low Loading Iridium Electrode for Proton Exchange Membrane Water Electrolyzer
ECS Meeting Abstracts·2020
Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation
Polymers·2019· 23 citedOpen Access
Interpretation of the roughness at interfaces of photoresists from a perspective molecular aspect
Bulletin of the American Physical Society·2018

Frequent Co-authors

Su‐Mi Hur(7), Juan Pablo(7), Hyun Park(6), Boyuan Yu(6), Emad Tajkhorshid(6), Ludwig Schneider(6), Sun Ge(5), Myungwoong Kim(3), Hye-Keun Oh(3), Eun Ji Kim(2), Jae Man Shin(2), Gue Seon Lee(2), Jinwoong Choi(2), Joona Bang(2), Jeung Gon Kim(2), Bumjoon J. Kim(2), Sunggyu Lee(2), Danilo De Simone(2), Vikram Thapar(2), Yeojin Choe(2)