Veena Rao

Engineering · Physical Sciences

10h-index719citations34works2.02yr avg
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Research Topics

Advancements in Photolithography Techniques(15), Magnetic Properties and Applications(9), Electric Motor Design and Analysis(8), Non-Destructive Testing Techniques(7), Nanofabrication and Lithography Techniques(7)

Publications33 total

Multi-Partner Project: Key Enabling Technologies for Cognitive Computing Continuum - MYRTUS Project Perspective
2025· 1 cited
MYRTUS: Multi-layer 360° dYnamic orchestration and interopeRable design environmenT for compute-continUum Systems
2024· 3 citedOpen Access
Comparing Outcomes of COVID-19 vs NonCOVID-19 Lung Transplant Recipients on ECMO as a Bridge to Transplant
The Journal of Heart and Lung Transplantation·2022· 1 citedOpen Access
Progress in 157-nm lithography development at Intel: resists and reticles
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000
New materials for 157-nm photoresists: characterization and properties
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000· 29 cited
<title>Defects and metrology of ultrathin resist films</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2000· 3 cited
Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1999· 40 cited
Ultrathin photoresists for EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 19 cited
Novel silicon-containing resists for EUV and 193-nm lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1999· 5 cited
Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1998· 7 citedOpen Access
Progress in 193-nm top-surface imaging process development
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1998· 12 cited
Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1998· 2 cited
Top-surface imaging resists for EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1998· 15 cited
Top Surface Imaging for Extreme Ultraviolet Lithography.
Journal of Photopolymer Science and Technology·1998· 10 citedOpen Access
Structure in Thin and Ultrathin Spin-Cast Polymer Films
Science·1996· 471 cited
Variability of the flow field in the inner shelf along the central east coast of India during April, 1989
Continental Shelf Research·1995· 4 cited
Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1994· 4 cited
Langmuir—Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists
ACS symposium series·1993
<title>Influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1993· 2 cited
Influence of sensitizer spatial distribution on the dissolution mechanism in diazonaphthoquinone resists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1992· 3 cited
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Frequent Co-authors

Craig C. Henderson(8), William D. Hinsberg(5), Susan M. Holl(5), John M. Hutchinson(5), Jonathan Cobb(4), Uzodinma Okoroanyanwu(4), David R. Wheeler(4), Curtis W. Frank(4), Roger Fabian W. Pease(4), Janet Chambers(3), Donna J. O’Connell(3), J. E. M. Goldsmith(3), C. W. Frank(2), R. F. W. Pease(2), Robert L. Brainard(2), Joseph F. Mackevich(2), Ling Liao(2), Aaron Fisher(2), Siddhartha Das(2), G. F. Cardinale(2)